Suppression of OH Generation from the Photo-Fenton Reaction in the Presence of α-Pinene Secondary Organic Aerosol Material,Environmental Science & Technology Letters

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Suppression of OH Generation from the Photo-Fenton Reaction in the Presence of α-Pinene Secondary Organic Aerosol Material
Environmental Science & Technology Letters ( IF 8.9 ) Pub Date : 2017-09-21 00:00:00 , DOI: 10.1021/acs.estlett.7b00381
Rachel F. Hems ₁ , Jeremy S. Hsieh ₁ , Mark A. Slodki ₁ , Shouming Zhou ₁ , Jonathan P.D. Abbatt ₁

Affiliation

Although Fenton and Photo-Fenton chemistry is thought to be an important source of OH in cloud and fog water, a high dissolved organic content, especially of secondary organic aerosol (SOA) material, may affect the production of OH via this mechanism. The relative production of OH was measured for Fenton and Photo-Fenton reactions with H₂O₂ and Fenton-like and Photo-Fenton-like reactions with α-pinene ozonolysis SOA material, under cloud water relevant conditions (5 μM iron, 45 μM H₂O₂, and 1500 μM SOA). It is demonstrated that the generation of OH radicals from Photo-Fenton chemistry can be significantly suppressed by addition of α-pinene SOA material, where the OH yield for solutions containing H₂O₂ and SOA material together was decreased by a factor of 6 compared to that when only H₂O₂ was present, likely because of complexation by carboxylic acids (such as pinonic acid). When SOA is examined without additional H₂O₂ present, OH is generated by Photo-Fenton chemistry but at a rate lower than that for Photo-Fenton chemistry with H₂O₂ alone. Without taking into account the suppression by SOA material, one may overestimate the generation of OH by Photo-Fenton chemistry. Furthermore, the suppression of Photo-Fenton chemistry in aqueous organic aerosol may be enhanced by a higher SOA material concentration.

中文翻译：

α-P烯次要有机气溶胶材料存在下，通过光芬顿反应抑制OH的生成

尽管Fenton和Photo-Fenton化学被认为是云雾水中OH的重要来源，但高溶解有机物含量（尤其是次要有机气溶胶（SOA）材料）可能会通过这种机制影响OH的产生。OH的相对产量测定芬顿和光芬顿反应用H ₂ ö ₂和类芬顿和光类芬顿与α蒎烯臭氧分解SOA材料反应，云水相关条件（5μM铁，45μM下H ₂ O ₂和1500μMSOA）。结果表明，通过添加α-pine烯SOA材料可以显着抑制光芬顿化学产生的OH自由基，其中含H ₂ O的溶液的OH收率与仅存在H ₂ O _2的情况相比，图₂和SOA的材料一起减少了6倍，这很可能是由于羧酸（如品酸）的络合。当检查SOA时不存在额外的H ₂ O _2时，OH是通过光芬顿化学生成的，但其生成速率低于仅使用H ₂ O ₂的光芬顿化学生成的速率。在不考虑SOA材料的抑制作用的情况下，人们可能会高估Photo-Fenton化学方法产生的OH。此外，可以通过更高的SOA材料浓度来增强对水性有机气溶胶中光芬顿化学的抑制。

更新日期：2017-09-21

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