Abstract The magnetic properties of amorphous glass coated microwires are determined mainly by the distribution of residual quenching stresses over the microwire cross section. In this paper a control of the residual quenching stresses in amorphous ferromagnetic microwires is achieved by changing the microwire glass shell thickness by etching. To this end, a special gel is synthesized for precision glass shell etching of series of Co-rich microwires. The use of the gel provides a possibility of uniform etching of the microwire glass coating at a rate of 0.2–3.2 μm/h depending on the amount of glass already removed, a surface roughness being about 40–100 nm. It is also possible to completely remove the glass shell of the microwire without damage its metallic nucleus. The small angle magnetization rotation method has been used to determine the change in the amplitude of the residual quenching stress with a gradual decrease of the glass shell thickness of microwires of composition Co67Fe4Ni2Mo2B11Si14 and Co71Fe4Si10B15. It is found that the amplitude of the residual quenching stress deceases by 40–50% in average after removing of the layer of 1 μm thickness from the glass coating.

中文翻译：

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玻璃壳蚀刻以控制富钴非晶铁磁微线中的残余淬火应力

摘要 非晶玻璃涂层微丝的磁性能主要取决于微丝截面上残余淬火应力的分布。在本文中，通过蚀刻改变微丝玻璃壳厚度来控制非晶铁磁微丝中的残余淬火应力。为此，合成了一种特殊的凝胶，用于一系列富钴微线的精密玻璃壳蚀刻。凝胶的使用提供了以 0.2-3.2 μm/h 的速率均匀蚀刻微丝玻璃涂层的可能性，这取决于已经去除的玻璃量，表面粗糙度约为 40-100 nm。也可以完全去除微丝的玻璃壳而不损坏其金属核。小角度磁化旋转法已被用于确定残余淬火应力的幅度随着成分为 Co67Fe4Ni2Mo2B11Si14 和 Co71Fe4Si10B15 的微丝的玻璃壳厚度的逐渐减小而发生的变化。发现从玻璃涂层上去除1μm厚的层后，残余淬火应力的幅度平均降低了40-50%。