AlN nanostructures with controllable morphologies are synthesized on the Si substrate with Al particles layer as self-catalyst by chemical vapor deposition (CVD) technique at atmospheric pressure. The effects of the temperature, NH3 flow and gas entrance procedure on the morphologies are investigated. Especially, among these nanostructures, the AlN nanowhsikers exhibit a high aspect ratio, which is about one order of magnitude larger than that of other AlN nanostructures. The mechanism of controlled morphology is proposed based on the self-catalyzed nucleation and the diffusion process of Al adatoms surface under different reaction conditions (either Al-rich or N-rich). Moreover, the AlN nanostructures exhibit intense photoluminescence and can be tuned by the size and morphology of nanostructures.

中文翻译：

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AlN纳米结构的可控合成及其光致发光

在大气压下，通过化学气相沉积（CVD）技术在具有Al颗粒层作为自催化剂的Si衬底上合成了形态可控的AlN纳米结构。研究了温度，NH3流量和气体进入程序对形貌的影响。特别地，在这些纳米结构中，AlN纳米晶表现出高的纵横比，其比其他AlN纳米结构的纵横比大约一个数量级。基于自催化成核作用和不同反应条件下（富铝或富氮）铝吸附原子表面的扩散过程，提出了可控形态的机理。而且，AlN纳米结构表现出强烈的光致发光并且可以通过纳米结构的尺寸和形态来调节。