Abstract We address the impact of chromium (Cr) incorporation ( 2 :Cr) films for as-grown and after flash-lamp-annealing (FLA) states. Samples were produced by DC magnetron sputtering on either unheated or heated (400 °C) substrates. Complementary medium- and local-order information was extracted by X-ray diffraction and absorption near-edge structure, respectively. TiO 2 :Cr grown on unheated substrates are amorphous with the major contribution from Cr 3+ and progressive formation of Cr 6+ with Cr. On heated substrates, anatase phase is dominant for low Cr levels (≤7 at.%) and the structure evolves with Cr towards a disordered mixed-oxide with rutile structure. By tuning the FLA energy density, customized (single or mixed) phase formation is achieved from (initially amorphous) Cr-free TiO 2 . For amorphous TiO 2 :Cr with low Cr (≤7 at.%), FLA induces a short-range rutile structure but structural ordering is not observed at higher Cr levels. Nonetheless, FLA annihilates Cr 6+ sites and promotes Cr 4+ , which is associated to the mixed-oxide rutile. FLA also improves the pristine structure of anatase TiO 2 :Cr grown on heated substrates. These results provide relevant information about the atomic structure of mixed oxides and the use of FLA for the synthesis of band-gap engineered TiO 2 -based materials.

中文翻译：

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铬在生长和闪光灯退火溅射沉积氧化钛膜中掺入的结构影响

摘要我们解决了铬 (Cr) 掺入 (2:Cr) 薄膜对生长状态和闪光灯退火 (FLA) 状态的影响。样品是通过直流磁控溅射在未加热或加热 (400 °C) 基板上生产的。互补的中阶和局部阶信息分别通过 X 射线衍射和吸收近边结构提取。TiO 2 :Cr 在未加热基材上生长是无定形的，主要来自 Cr 3+ 和 Cr 6+ 与 Cr 的逐渐形成。在加热的基材上，锐钛矿相在低 Cr 水平（≤7 at.%）时占主导地位，并且结构随 Cr 演变为具有金红石结构的无序混合氧化物。通过调整 FLA 能量密度，从（初始非晶态）无 Cr TiO 2 实现定制（单相或混合）相形成。对于具有低 Cr (≤7 at.%) 的无定形 TiO 2 :Cr，FLA 诱导短程金红石结构，但在较高 Cr 水平下未观察到结构有序。尽管如此，FLA 会消灭 Cr 6+ 位点并促进与混合氧化物金红石相关的 Cr 4+ 。FLA 还改善了锐钛矿型 TiO 2 :Cr 在加热基板上生长的原始结构。这些结果提供了有关混合氧化物的原子结构和 FLA 用于合成带隙工程 TiO 2 基材料的相关信息。