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Enhanced Properties of Co–Sn Coatings Electrodeposited from Choline Chloride-Based Deep Eutectic Solvents
Crystal Growth & Design ( IF 3.8 ) Pub Date : 2017-09-18 00:00:00 , DOI: 10.1021/acs.cgd.7b00703
Nuno M. Pereira 1 , Célia T. Sousa 2 , Carlos M. Pereira 1 , João P. Araújo 2 , A. Fernando Silva 1
Affiliation  

Co–Sn alloy films were electrodeposited from choline chloride (ChCl)–ethylene glycol (EG) and choline chloride (ChCl)–urea (U) eutectic mixtures. The deposition of Co–Sn alloy on a copper electrode was studied by cyclic voltammetry, which demonstrates that the coelectrodeposition was achieved. For comparison of properties, Co–Sn alloys were deposited from electrolytes with different Co/Sn ratios. The X-ray diffraction patterns (XRD) showed that the phase structure was affected by the Co/Sn ratio; nevertheless, Co3Sn2 was always the predominant phase. Traces of metallic cobalt were also detected. The nature of the electrolyte used and the metallic composition affected the morphologies of the deposits and their corrosion resistance. The best corrosion resistant coating, with a corrosion potential of −617 mV, was composed by 44.4 wt % of Co and 55.6% of Sn, and it was obtained from the ChCl–EG electrolyte. The magnetic properties of the analyzed samples did not present an evident relationship with the metallic ions ratio in solution.

中文翻译:

从基于氯化胆碱的深共熔溶剂中电沉积的Co-Sn涂层的增强性能

Co-Sn合金膜由氯化胆碱(ChCl)-乙二醇(EG)和氯化胆碱(ChCl)-尿素(U)共晶混合物电沉积而成。通过循环伏安法研究了Co-Sn合金在铜电极上的沉积,表明实现了共电沉积。为了进行性能比较,从具有不同Co / Sn比的电解质中沉积了Co-Sn合金。X射线衍射图谱(XRD)表明相结构受Co / Sn比的影响。尽管如此,Co 3 Sn 2始终是主要阶段。还检测到痕量的金属钴。所用电解质的性质和金属成分会影响沉积物的形貌及其耐蚀性。最好的耐腐蚀涂层,腐蚀电位为-617 mV,由44.4 wt%的Co和55.6%的Sn组成,是从ChCl–EG电解质中获得的。分析样品的磁性能与溶液中金属离子的比例没有明显的关系。
更新日期:2017-09-19
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