Directly Photopatternable Polythiophene as Dual-Tone Photoresist,Macromolecules

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Directly Photopatternable Polythiophene as Dual-Tone Photoresist
Macromolecules ( IF 5.1 ) Pub Date : 2017-09-12 00:00:00 , DOI: 10.1021/acs.macromol.7b01208
Xiaoran Hu ₁ , John A. Lawrence ₁ , James Mullahoo ₁ , Zachary C. Smith ₁ , Daniel J. Wilson ₁ , Charles R. Mace ₁ , Samuel W. Thomas ₁

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We report a directly photopatternable polythiophene derivative PT_oNB with o-nitrobenzyl (oNB)-functionalized side chains. PT_oNB has unique phototunable solubilities programmed through three stages: (i) organic-soluble/aqueous-insoluble, (ii) organic-insoluble/aqueous-insoluble, and (iii) organic-insoluble/aqueous soluble. The capability to control conjugated polymer solubility with spatiotemporal precision and orthogonal developer solvents through three stages allows for direct patterning of this conjugated polymer and provides flexibility to choose between positive and negative tone photolithography. This approach to photomodulate solubility also enables all-solution processing of multilayer stacked conjugated polymer films; we demonstrate here direct two-layer photopatterning with this novel conjugated polymer photoresist.

中文翻译：

可直接光图案化的聚噻吩作为双色调光刻胶

我们报道了具有邻硝基苄基（o NB）-官能化侧链的直接可光图案化的聚噻吩衍生物PT _{o NB}。PT _Ø_NB具有通过三个阶段编程的独特的光可调溶解度：（i）有机不溶/水不溶，（ii）有机不溶/水不溶，和（iii）有机不溶/水不溶。通过时空精度和正交显影剂溶剂通过三个阶段控制共轭聚合物溶解度的能力允许对该共轭聚合物进行直接构图，并提供了在正性和负性光刻之间进行选择的灵活性。光调制溶解度的这种方法还可以对多层堆叠的共轭聚合物薄膜进行全溶液处理。我们在这里展示了用这种新型的共轭聚合物光致抗蚀剂进行的直接两层光图案化。

更新日期：2017-09-12

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