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Growth of a Superhydrophobic Multi-walled Carbon Nanotube Forest on Quartz Using Flow-vapor-Deposited Copper Catalysts
Carbon ( IF 10.5 ) Pub Date : 2017-11-01 , DOI: 10.1016/j.carbon.2017.09.023
Chung-Hsuan Hsiao , Jarrn-Horng Lin

Abstract Although studies on carbon nanotube (CNT) growth have made great advancements, direct growth of highly dense CNTs on desired substrates or positions remains an important challenge. Herein, we report a simple method to directly fabricate a CNT forest on a quartz surface using a copper catalyst at 850 °C under a stream of argon-diluted ethanol. Copper nanoparticles (NPs) are used as catalysts, which are generated through flow-vapor-deposition of copper (II) acetylacetonate on a thermal-treated SiO2 (quartz) or Si (silicon wafer) surface. Dense tangled CNT forms on the quartz surface. However, when a silicon wafer is used as the substrate, the only product is a carbon-covered copper NPs instead of CNTs. The growth yield of CNTs is approximately 10.5 g CNT/g Cu⋅h as characterized by thermogravimetric analysis, which is remarkably high compared with those achieved by conventional copper-based catalysts. The stronger metal-support interaction of copper NPs with quartz is suggested to be the key factor for CNT growth. Bamboo-like MWCNTs (BMWCNTs) are the main structures formed through transportation of copper NPs during CNT formation as evidenced by HR-TEM micrographs. Moreover, CNT-grown quartz has superhydrophobic features with a contact angle of 154°, revealing its promising application in self-cleaning coatings.

中文翻译:

使用流动气相沉积铜催化剂在石英上生长超疏水多壁碳纳米管林

摘要 尽管对碳纳米管 (CNT) 生长的研究取得了很大进展,但在所需基板或位置上直接生长高密度 CNT 仍然是一个重要的挑战。在此,我们报告了一种简单的方法,在 850°C 下在氩稀释的乙醇流下使用铜催化剂在石英表面上直接制造 CNT 森林。铜纳米颗粒 (NPs) 用作催化剂,通过在热处理的 SiO2(石英)或 Si(硅晶片)表面上流动气相沉积乙酰丙酮酸铜 (II) 生成。在石英表面形成密集缠结的 CNT。然而,当使用硅晶片作为基板时,唯一的产物是碳覆盖的铜 NPs 而不是 CNTs。通过热重分析表征,碳纳米管的生长产量约为 10.5 g CNT/g Cu⋅h,与传统的铜基催化剂相比,这是非常高的。铜纳米颗粒与石英之间更强的金属-载体相互作用被认为是碳纳米管生长的关键因素。如 HR-TEM 显微照片所证明的,竹状 MWCNTs (BMWCNTs) 是在 CNT 形成过程中通过铜 NPs 的传输形成的主要结构。此外,碳纳米管生长的石英具有接触角为 154° 的超疏水特性,显示其在自清洁涂层中的应用前景。
更新日期:2017-11-01
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