Abstract In this work, three halogeno-indazole compounds were investigated for corrosion inhibition of copper in 3.0 wt% NaCl solution using potentiodynamic polarization measurement, electrochemical impedance spectroscopy, and X-ray diffraction (XRD) analysis. The electrochemical results revealed that all of these organics are mixed-type inhibitors with an inhibitive ability order: 4-CIA > 4-BIA > 4-FIA, which was further confirmed by observations with field emission scanning electron microscope (FE-SEM) and atomic force microscope (AFM). Their favourable performance is ascribed to the formation of inhibitor-adsorption films on copper. Furthermore, theoretical calculations showed the electronic structure of studied compounds and their optimized adsorption configurations on the copper surface.

中文翻译：

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三种吲唑衍生物作为铜在中性氯化物溶液中的缓蚀剂

摘要 在这项工作中，使用动电位极化测量、电化学阻抗谱和 X 射线衍射 (XRD) 分析研究了三种卤代吲唑化合物在 3.0 wt% NaCl 溶液中对铜的腐蚀抑制。电化学结果表明，所有这些有机物都是混合型抑制剂，抑制能力顺序为：4-CIA > 4-BIA > 4-FIA，通过场发射扫描电子显微镜（FE-SEM）和原子力显微镜（AFM）。它们的良好性能归因于在铜上形成了抑制剂吸附膜。此外，理论计算显示了所研究化合物的电子结构及其在铜表面上的优化吸附构型。