Directed self-assembly (DSA) of the domain structure in block copolymer (BCP) thin films is a promising approach for sub-10-nm surface patterning. DSA requires the control of interfacial properties on both interfaces of a BCP film to induce the formation of domains that traverse the entire film with a perpendicular orientation. Here we show a methodology to control the interfacial properties of BCP films that uses a polymer topcoat deposited by initiated chemical vapour deposition (iCVD). The iCVD topcoat forms a crosslinked network that grafts to and immobilizes BCP chains to create an interface that is equally attractive to both blocks of the underlying copolymer. The topcoat, in conjunction with a chemically patterned substrate, directs the assembly of the grating structures in BCP films with a half-pitch dimension of 9.3 nm. As the iCVD topcoat can be as thin as 7 nm, it is amenable to pattern transfer without removal. The ease of vapour-phase deposition, applicability to high-resolution BCP systems and integration with pattern-transfer schemes are attractive properties of iCVD topcoats for industrial applications.

中文翻译：

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通过具有蒸汽相沉积的面漆的嵌段共聚物薄膜的定向自组装进行亚10纳米构图

嵌段共聚物（BCP）薄膜中畴结构的定向自组装（DSA）是用于亚10纳米以下表面构图的有前途的方法。DSA要求控制BCP膜两个界面上的界面性质，以诱导形成以垂直方向横穿整个膜的畴。在这里，我们展示了一种控制BCP膜界面性能的方法，该方法使用通过引发化学气相沉积（iCVD）沉积的聚合物面漆。iCVD面漆形成了一个交联网络，该网络接枝并固定了BCP链以形成一个界面，该界面对下面的共聚物的两个嵌段均具有同等的吸引力。面漆与化学图案化的基材一起，可指导光栅结构在BCP膜中的组装，其半节距尺寸为9.3 nm。由于iCVD面漆的厚度可以薄至7 nm，因此可以在不去除的情况下进行图案转移。汽相沉积的简便性，对高分辨率BCP系统的适用性以及与图案转移方案的集成是工业应用iCVD面漆的诱人特性。