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Inorganic and Nano-Metal Chemistry
基本信息
期刊名称 Inorganic and Nano-Metal Chemistry
INORG NANO-MET CHEM
期刊ISSN 2470-1556
期刊官方网站 https://www.tandfonline.com/loi/lsrt21
是否OA
出版商 Taylor and Francis Ltd.
出版周期
始发年份
年文章数 47
最新影响因子 1.716(2020)  scijournal影响因子  greensci影响因子
中科院SCI期刊分区
大类学科 小类学科 Top 综述
化学4区 CHEMISTRY, INORGANIC & NUCLEAR 无机化学与核化学4区
NANOSCIENCE & NANOTECHNOLOGY 纳米科技4区
CiteScore
CiteScore排名 CiteScore SJR SNIP
学科 排名 百分位 0.71 0.178 0.218
Chemistry
Inorganic Chemistry
58 / 69 16%
Chemistry
Physical and Theoretical Chemistry
129 / 160 19%
补充信息
自引率 1.00%
H-index 41
SCI收录状况 Science Citation Index Expanded
官方审稿时间
网友分享审稿时间 数据统计中,敬请期待。
PubMed Central (PML) http://www.ncbi.nlm.nih.gov/nlmcatalog?term=2470-1556%5BISSN%5D
投稿指南
期刊投稿网址 https://mc.manuscriptcentral.com/lsrt#
收稿范围

Inorganic and Nano-Metal Chemistry is devoted to the rapid dissemination of original research papers of relevance to inorganic and metal-organic chemists and nano-scientists engaged in synthesis and characterization of Inorganic, Main Group, Metal-Organic and Nano-Particulate Constructs. This journal publishes syntheses and reactivity of new compounds, new classes of nanoparticles, new methods for preparation of known compounds and nanoparticles, and new experimental techniques and procedures. The journal is a publication aimed at the rapid dissemination of original research papers of particular importance to inorganic and metal-organic chemists and nanotechnology professionals. Original research articles that warrant speedy publication because of the unique scientific features and unprecedented scientific value will be given high priority in the peer reviewing process and published as a "High Priority Publication." 

Although the primary emphasis will be placed on original research contributions, preliminary communications containing full experimental details as well as brief reviews of general reactions or techniques presented from a critical point of view will be considered. From time to time, this journal will also publish review articles and thematic issues encompassing the areas of Inorganic, Metal-Organic, Nano-Compatible and Nano-Metal Chemistry. Active and recognized researchers will be invited to contribute to review articles. Manuscripts in English only will be accepted for publication. 

Peer-Review Policy 
All submitted manuscripts are subject to initial appraisal by the Editor-in-Chief, and, if found suitable for further consideration, to rigorous and rapid peer review by independent, anonymous expert referees. All peer review is single blind and submission is online via ScholarOne Manuscripts:  https://mc.manuscriptcentral.com/lsrt 

Publishing Ethics Statement 
The Journal adheres to the highest standards of publishing ethics, with rigorous processes in place to ensure this is achieved. Taylor & Francis is a member of Committee of Publication Ethics (COPE) and utilizes Similarity Check via CrossRef for all journals. More information on our ethical standards and policies can be found here: http://authorservices.taylorandfrancis.com/ethics-for-authors/
The Journal has an appeals and complaints policy which can be viewed here: https://authorservices.taylorandfrancis.com/peer-review-appeals-and-complaints-from-authors/

收录体裁
投稿指南
投稿模板
参考文献格式
编辑信息
Editor-in-Chief:
Raghuraman Kannan 
Department of Radiology 
Room 106, Alton Building, 301 Business Loop 70 W 
University of Missouri-Columbia 
Columbia, MO 65212, USA 

Executive Editor:
Departments of Radiology and Physics 
Room 106, Alton Building, 301 Business Loop 70 W 
University of Missouri-Columbia 
Columbia, MO 65212, USA 
 
Associate Editors:
P.K. Das - Indian Institute of Science, India
W. Linert - Technische Universität, Vienna 
J.J. Vittal  - National University of Singapore, Singapore  
H. White -  University of Missouri, Missouri

M. Yamashita -  Tohoku University, Japan

 
International Editorial Advisory Board:

Chairman: M. F. Hawthorne
 - University of California, Los Angeles

P. A. Ajibade - University of Fort Hare, South Africa 
R. Alberto - University of Zürich, Switzerland 
M. Amiji - Northeastern University, Boston 
M. I. Baraton - University of Limoges, France 
P. J. Dyson - Swiss Federal Institute of Technology, Switzerland 
J. Forniés - Universidad de Zaragoza, Spain 
G. W. Gokel - University of Missouri, Columbia 
G. Gordon - Miami University - Ohio, Oxford 
H. D. Kaesz - University of California, Los Angeles 
D. A. Knight - Florida Institute of Technology, Melbourne 
J. J. Lagowski - University of Texas, Austin 
S. S. Lee - Gyeongsang National University, Korea 
J. Liu - University of Missouri-St. Louis, St. Louis 
N. M. Made Gowda - Western IllinoisUniversity, Macomb 
G. Mani - Indian Institute of Technology, India 
R. Murugavel - IIT Bombay, India 
M. Palaniandavar - Barathidasan University, India 
G. H. Robinson - The University of Georgia, Athens 
A. G. Samuelson - Indian Institute of Science, India 
I. Santos - Instituto Tecnológico e Nuclear Estrada, Nacional, Portugal 
D. W. Slocum - Western Kentucky University, Bowling Green 
C. J. Smith - University of Missouri, Columbia 
E. H. Wong - University of New Hampshire, Durham 
A. Yamamoto - Waseda University, Tokyo

Journal Editorial Administrator  
Anandhi Upendran
 
Editorial Associates  
Kavita Katti 
Ajit Zambre 
Nripen Chanda 
Ravi Shukla


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