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Advanced Optical Materials
基本信息
期刊名称 Advanced Optical Materials
ADV OPT MATER
期刊ISSN 2195-1071
期刊官方网站 http://onlinelibrary.wiley.com/journal/10.1002/%28ISSN%292195-1071
是否OA
出版商 John Wiley and Sons Inc.
出版周期
始发年份
年文章数 467
最新影响因子 9.0(2022)  scijournal影响因子  greensci影响因子
中科院SCI期刊分区
大类学科 小类学科 Top 综述
工程技术1区 MATERIALS SCIENCE, MULTIDISCIPLINARY 材料科学:综合2区
OPTICS 光学1区
CiteScore
CiteScore排名 CiteScore SJR SNIP
学科 排名 百分位 7.36 2.711 1.580
Physics and Astronomy
Atomic and Molecular Physics, and Optics
10 / 173 94%
Materials Science
Electronic, Optical and Magnetic Materials
15 / 225 93%
补充信息
自引率 9.00%
H-index 36
SCI收录状况 Science Citation Index Expanded
官方审稿时间
网友分享审稿时间 数据统计中,敬请期待。
PubMed Central (PML) http://www.ncbi.nlm.nih.gov/nlmcatalog?term=2195-1071%5BISSN%5D
投稿指南
期刊投稿网址 https://www.editorialmanager.com/advopticalmat/default.aspx
收稿范围

Aims and Scope

Advanced Optical Materials is an international, interdisciplinary forum for peer-reviewed papers on materials science which focuses on all aspects of light-matter interactions. Advanced Optical Materials was published as a special focus section integrated in Advanced Materials in 2012 and launched as a journal at the start of 2013. Advanced Optical Materials has an Impact Factor of 7.125 (2018 Journal Impact Factor, Journal Citation Reports (Clarivate Analytics, 2019)).

The scope of Advanced Optical Materials is dedicated to breakthrough discoveries and fundamental research in photonics, plasmonics, metamaterials, and more. The following is a non-exhaustive list of the topics covered in Advanced Optical Materials:

  • Photonic crystals
  • Nonlinear optics
  • Optical nanostructures
  • Optoelectronics
  • Optical devices, detectors & sensors
  • Holography
  • Opto-acoustic materials
  • Optical data storage
  • Micro/nano resonators
  • Optical waveguides

Advanced Optical Materials contains an attractive mix of Communications, Full papers, Review Articles and Progress Reports with the same article specifications as Advanced Materials. For more information please see www.advopticalmat.com.


收录体裁
Communications
Full Papers
Reviews
Progress Reports
Essays
Correspondences
投稿指南 https://onlinelibrary.wiley.com/page/journal/21951071/homepage/2298_forauthors.html
投稿模板 https://onlinelibrary.wiley.com/page/journal/21951071/homepage/2298_forauthors.html
参考文献格式
编辑信息

AUS Igor Aharonovich, University of Technology Sydney

SW  Hatice Altug, EPFL, Lausanne

USA Andrea Alu, University of Texas at Austin

USA Richard Averitt, University of California, San Diego, CA, USA

USA Paul Braun, University of Illinois at Urbana-Champaign

USA Mark Brongersma, Stanford University

USA Timothy Bunning, Air Force Research Laboratory

GER Harald Giessen, University of Stuttgart

CH  Qihuang Gong, Peking University

CH  Jianhua Hao, The Hong Kong Polytechnic University, Hung Hom, Hong Kong

JP    Satoshi Kawata, Osaka University and RIKEN

JP    Junji Kido, Yamagata University

KOR Dong Yu Kim, GIST, Gwangju

FR   Philippe Lalanne, LP2N, Talence Cedex

CH  Jian-Feng Li, Xiamen University

CH  Zhi-Yuan Li, South China University of Technology, Guangzhou, China

UK   David Lidzey, University of Sheffield

ESP Michal Lipson, Columbia University

S     Xiaogang Liu, NUS, Singapore

ESP Luis Liz-Marzán, CIC biomaGUNE, San Sebastián

S     Kian Ping Loh, NUS, Singapore

ESP Cefe López, ICMM, Madrid

UK   Stefan Maier, Ludwig-Maximilians-Universität München, Germany

ESP Hernán Miguez, Spanish National Research Council, Spain

ESP Bumki Min, KAIST, Taejon

ISR  Dan Oron, Weizmann Institute of Science

KOR Soo Young Park, Seoul National University

NED Albert Polman, AMOLF, Amsterdam

ESP Romain Quidant, ICFO, Barcelona

USA James Schuck, LBL, Berkeley

UK   Ullrich Steiner, AMI, Fribourg

CH  Yikai Su, Shanghai Jiao Tong University

CH  He Tian, ECUST, Shanghai

GB   Ventsislav K. Valev, University of Bath

CH  Jianfang Wang, Chinese University of Hong Kong

GER Martin Wegener, KIT, Karlsruhe

GER Ralf Wehrspohn, Fraunhofer IWM, Halle

CH  Wai-Yeung Wong, The Hong Kong Polytechnic University, China

IT    Diederik Wiersma, LENS, Florence

USA Fengnian Xia, Yale University

CH  Yong Sheng Zhao, ICCAS, Beijing

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