In 1983, the two journals, Journal of Vacuum Science and Technology A and B were launched when the original Journal of Vacuum Science and Technology was split.
JVSTA is devoted to publishing reports of original research, letters, and review articles on interfaces and surfaces of materials, thin films, and plasmas. JVSTA publishes reports that advance the fundamental understanding of interfaces and surfaces at a fundamental level and that use this understanding to advance the state of the art in various technological applications. The scope includes, but is not limited to, the following topics:
Applied and fundamental surface science
Atomic layer deposition
Electronic and photonic materials and their processing
Magnetic thin films and interfaces
Materials and thin films for energy conversion and storage
Photovoltaics, including inorganic and organic thin-film solar cells
Plasma science and technology, including plasma-surface interactions, plasma diagnostics plasma deposition and etching, and applications of plasmas to micro- and nanoelectronics
Surface engineering
Thin film deposition, etching, properties, and characterization
Transmission electron microscopy, including in situ methods
Tribology
Vacuum science and technology

JVST Editorial Board
Steven L. Bernasek, Princeton University
Yves J. Chabal, University of Texas at Dallas
Vincent M. Donnelly, University of Houston
Alfred Grill, IBM T.J. Watson Research Center
Sarah R. Kurtz, National Renewable Energy Laboratory
Tadatsugu Minami, Kanazawa Institute of Technology
Stephen J. Pearton, University of Florida
R. Ramesh, Univ. of California at Berkeley
Jack Rowe, North Carolina State University
Ellen D. Williams, University of Maryland
Richard van de Sanden, Eindhoven University of Technology
Mikhail Zharnikov, Universität Heidelberg
AVS Publications Committee 
Chair: Ivan Petrov, University of Illinois at Urbana-Champaign
Vice Chair: Charles R. “Chip” Eddy, Jr., Naval Research Laboratory 
Gregory J. Exarhos, Pacific Northwest National Laboratory 
Lara Gamble, University of Washington
Jay Hendricks, NIST 
Jane P. Chang, University of California, Los Angeles