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MICROELECTRONICS JOURNAL
基本信息
期刊名称 MICROELECTRONICS JOURNAL
MICROELECTRON J
期刊ISSN 0026-2692
期刊官方网站 http://www.journals.elsevier.com/microelectronics-journal/
是否OA
出版商
出版周期 Monthly
始发年份
年文章数 154
最新影响因子 2.2(2022)  scijournal影响因子  greensci影响因子
中科院SCI期刊分区
大类学科 小类学科 Top 综述
工程技术4区 ENGINEERING, ELECTRICAL & ELECTRONIC 工程:电子与电气4区
NANOSCIENCE & NANOTECHNOLOGY 纳米科技4区
CiteScore
CiteScore排名 CiteScore SJR SNIP
学科 排名 百分位 1.57 0.000 0.000
Materials Science
Surfaces, Coatings and Films
57 / 116 51%
Physics and Astronomy
Atomic and Molecular Physics, and Optics
82 / 173 52%
Materials Science
Electronic, Optical and Magnetic Materials
104 / 225 53%
Physics and Astronomy
Condensed Matter Physics
188 / 397 52%
Engineering
Electrical and Electronic Engineering
274 / 661 58%
补充信息
自引率 10.00%
H-index 54
SCI收录状况 Science Citation Index Expanded
官方审稿时间
网友分享审稿时间 数据统计中,敬请期待。
PubMed Central (PML) http://www.ncbi.nlm.nih.gov/nlmcatalog?term=0026-2692%5BISSN%5D
投稿指南
期刊投稿网址 http://ees.elsevier.com/mej/
收稿范围

Published since 1969, the Microelectronics Journal is an international forum for the dissemination of research and applications of microelectronic systems, circuits, and emerging technologies. Papers published in the Microelectronics Journal have undergone peer review to ensure originality, relevance, and timeliness. The journal thus provides a worldwide, regular, and comprehensive update on microelectronic circuits and systems.

The Microelectronics Journal invites papers describing significant research and applications in all of the areas listed below. Comprehensive review/survey papers covering recent developments will also be considered. The Microelectronics Journalcovers circuits and systems. This topic includes but is not limited to

• Analog, digital, mixed, and RF circuits and related design methodologies
• Logic, architectural, and system level synthesis
• Testing, design for testability, built-in self-test
• Area, power, and thermal analysis and design
• Mixed-domain simulation and design
• Embedded systems
• Non-von Neumann computing and related technologies and circuits
• Design and test of high complexity systems integration
• SoC, NoC, SIP, and NIP design and test
• 3-D integration design and analysis
• Emerging device technologies and circuits, such as FinFETs, SETs, spintronics, SFQ, MTJ, etc.

Application aspects such as signal and image processing including circuits for cryptography, sensors, and actuators including sensor networks, reliability and quality issues, and economic models are also welcome.

收录体裁
Original papers, case studies, reports of conferences and meetings, book reviews and letters to the Editors. 
投稿指南 https://www.elsevier.com/journals/microelectronics-journal/0026-2692/guide-for-authors
投稿模板
参考文献格式 https://www.elsevier.com/journals/microelectronics-journal/0026-2692/guide-for-authors
编辑信息
Editor-in-Chief

E.G. Friedman

University of Rochester Department of Electrical and Computer Engineering, Computer Studies Building, Rochester, New York, NY 14627, United States, Fax: +1 585 506 0074Phone Phone +1 585 275 1022 
Special Issue Editor

Y. Wang

Tsinghua University, Beijing, China 
Editorial Board

A. Ahmadi

University of Windsor, Windsor, Ontario, Canada 

M. Alioto

National University of Singapore, Singapore, Singapore 

M. N. Bojnordi

The University of Utah, Salt Lake City, Utah, United States 

C.H. Chang

Nanyang Technological University, Singapore, Singapore 

M.H. Chowdhury

University of Missouri Kansas City, Kansas City, Missouri, United States 

I.B. Dhaou

University of Monastir Higher Institute of Computer Science and Mathematics of Monastir, Monastir, Tunisia 

A El-Moursy

University of Sharjah, Sharjah, United Arab Emirates 

M. El-Moursy

Mentor Graphics Egypt, Heliopolis, Egypt 

I.M. Elfadel

Khalifa University Department of Electrical Engineering and Computer Science, Abu Dhabi, United Arab Emirates 

A. Fish

Bar-Ilan University, Ramat Gan, Israel 

J.S. Friedman

University of Texas at Dallas, Richardson, Texas, United States 

F. Frustaci

University of Calabria Department of Computer Engineering Modelling Electronics and Systems, Rende, Italy 

B. Ghavami

Shahid Bahonar University of Kerman, Kerman, Iran, Islamic Republic of 

S. Ghoreishizadeh

Imperial College London, London, United Kingdom 

P. Giard

School of Engineering and Applied Technology, Montreal, Quebec, Canada 

G. Giustolisi

University of Catania, Catania, Italy 

N. Gong

University of South Alabama, Mobile, Alabama, United States 

X. Guo

Lehigh University, Bethlehem, Pennsylvania, United States 

M. R. Haider

University of Alabama at Birmingham, Birmingham, Alabama, United States 

H. Heidari

University of Glasgow, Glasgow, Scotland, United Kingdom 

B. Hu

Broadcom Ltd, Irvine, California, United States 

Z. Ignjatovic

University of Rochester, Rochester, United States 

R. Jakushokas

QUALCOMM Inc, San Diego, California, United States 

H. Jiao

Peking University, Beijing, China 

B.K. Kaushik

Indian Institute of Technology Roorkee, India 

F. Khateb

Brno University of Technology, Brno, Czech Republic 

S. Kose

University of South Florida - Sarasota-Manatee, Sarasota, Florida, United States 

F. Kurdahi

University of California Irvine, Irvine, California, United States 

V. Kursun

Hong Kong University of Science and Technology, Clear Water Bay, Kowloon, Hong Kong

S. Kvatinsky

Technion Israel Institute of Technology Faculty of Electrical Engineering, Haifa, Israel

B. Mohammad

Khalifa University of Science Technology - Abu Dhabi Campus, Abu Dhabi, United Arab Emirates 

H. Mostafa

Cairo University, Giza, Egypt 

A. Muhtaroğlu

Middle East Technical University, Turkey 

D. Nirmal

Karunya Institute of Technology and Sciences, Coimbatore, India 

D. Pamunuwa

University of Bristol, Bristol, United Kingdom 

I. Partin-Vaisband

University of Rochester, Rochester, New York, United States 

V.F. Pavlidis

The University of Manchester, Manchester, United Kingdom 

D.G. Perera

University of Colorado at Colorado Springs, Colorado Springs, Colorado, United States

C. Psychalinos

University of Patras Department of Physics, Patras, Greece 

D. Rossi

University of Bologna - Rimini Campus, Rimini, Italy 

I. Savidis

Drexel University, Philadelphia, Pennsylvania, United States 

G. Scotti

University of Rome La Sapienza, Roma, Italy 

R. Secareanu

Freescale Semiconductor Inc, Tempe, Arizona, United States 

S. Shekhar

Intel Corp Hawthorn Farm, Hillsboro, Oregon, United States 

G.C. Sirakoulis

Democritus University of Thrace Department of Electrical and Computer Engineeirng, Xanthi, Greece 

J.E. Stine, Jr.

Oklahoma State University Stillwater, Stillwater, Oklahoma, United States 

S. A. Tajalli

Federal Polytechnic School of Lausanne, Lausanne, Switzerland 

C.S. Tan

Nanyang Technological University, Singapore, Singapore 

B. Taskin

Drexel University, Philadelphia, Pennsylvania, United States 

A. Teman

Ben-Gurion University of the Negev, Be'er Sheva, Israel 

H. Thapliyal

University of Kentucky, Lexington, Kentucky, United States 

A. Todri-Sanial

University of Montpellier, Montpellier, France 

B. Vaisband

University of California Los Angeles Electrical and Computer Engineering Department, Los Angeles, California, United States 

D. Velenis

Leuven, Belgium 

U. Vishnoi

Marvell Semiconductor Inc, Santa Clara, California, United States 

I. Vourkas

Federico Santa Maria Technical University, Valparaiso, Chile 

C. Wang

Huazhong University of Science and Technology, Wuhan, China 

J. Wang

University of South Alabama, Mobile, Alabama, United States 

R. Weerasekera

University of Bristol School of Sociology Politics and International Studies, Bristol, United Kingdom 

S. Wimer

Bar-Ilan University, Ramat Gan, Israel 

J. Xie

Villanova University College of Engineering, Villanova, Pennsylvania, United States 
K. Xu
University of Electronic Science and Technology of China State Key Laboratory of Electronic Thin Films and Integrated Devices, Chengdu, China 

H. Yu

Southern University of Science and Technology, Shenzhen, China 

W. Yu

Old Dominion University, Norfolk, Virginia, United States 

Z. Zhang

University of Pennsylvania, Philadelphia, Pennsylvania, United States 

Z. Zhu

Xidian University, Xian, China 


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