The Journal of Applied Physics (JAP) is an influential 
international journal publishing significant new experimental and 
theoretical results of applied physics research.
Topics covered in JAP are diverse and reflect the most current applied physics research, including:
Applied biophysics
Dielectrics, ferroelectrics, and multiferroics
Electrical discharges, plasmas, and plasma-surface interactions
Emerging, interdisciplinary, and other fields of applied physics
Magnetism, spintronics, and superconductivity
Organic-Inorganic systems, including organic electronics
Photonics, plasmonics, photovoltaics, lasers, optical materials, and phenomena
Physics of devices and sensors
Physics of materials, including electrical, thermal, mechanical and other properties
Physics of matter under extreme conditions
Physics of nanoscale, mesoscale, and low-dimensional systems
Physics of semiconductors
Thin films, interfaces, and surfaces
The Journal of Applied Physics publishes manuscripts that:
 - Develop underlying physical principles for innovative technologies
 - Present scientific advances to modern applied physics problems across multiple disciplines
 - Enable real world applications based on innovative applied physics
 - Identify the physical reasons for materials properties

Editor-in-Chief
André Anders
 Director, Leibniz Institute of Surface Engineering (IOM), Leipzig, Germany
Deputy Editors
Christian Brosseau
 Université de Bretagne Occidentale, France
Laurie E. McNeil
 The University of North Carolina at Chapel Hill, Chapel Hill, NC, USA
Laurie E. McNeil
 The University of North Carolina at Chapel Hill, Chapel Hill, NC, USA
Associate Editors
David Aspnes
North Carolina State University, Raleigh, NC , USA

 Marcela Bilek 
University of Sydney, Australia

 Robert C. Birtcher
Argonne National Laboratory, Argonne, IL, USA

 Valentino R. Cooper
Oak Ridge National Laboratory, Oak Ridge, TN, USA

 Rachel S. Goldman
University of Michigan, Ann Arbor, MI, USA

 Jaime Gómez Rivas 
DIFFER-Dutch Institute for Fundamental Energy Research and Eindhoven University of Technology, Eindhoven, The Netherlands

 Axel Hoffmann 
Argonne National Laboratory, Argonne, IL, USA

 Pawel Keblinski 
Rensselaer Polytechnic Institute, Troy, NY, USA

 LaShanda Korley 
University of Delaware, Newark, DE, USA

 Jiangyu Li 
Shenzhen Institutes of Advanced Technology, Shenzhen, China 

 Wei Lu
Shanghai Institute of Technical Physics, Shanghai, China

 Andreas Mandelis 
University of Toronto, Toronto, Canada

 François M. Peeters
University of Antwerp, Belgium

 Lian-Mao Peng 
Peking University, Beijing, China

 Alain Polian 
Université Pierre et Marie Curie, Paris, France

 Yevgeny Raitses 
Princeton Plasma Physics Laboratory, Princeton, NJ, USA

 Hariharan Srikanth 
University of South Florida, Tampa, FL, USA

 Masayoshi Tonouchi 
Osaka University, Osaka, Japan

 Paolo Vavassori 
CIC nanoGune Consolider, San Sebastian, Spain

 Kin Man Yu 
City University of Hong Kong, Kowloon, Hong Kong