Applied Physics Letters (APL) features concise, up-to-date 
reports on significant new findings in applied physics. Emphasizing 
rapid dissemination of key data and new physical insights, APL offers 
prompt publication of new experimental and theoretical papers reporting 
applications of physics phenomena to all branches of science, 
engineering, and modern technology.
In addition to regular articles, the journal also publishes invited 
Fast Track, Perspectives, and in-depth Editorials which report on 
cutting-edge areas in applied physics.
APL Perspectives are forward-looking invited letters which highlight 
recent developments or discoveries. Emphasis is placed on very recent 
developments, potentially disruptive technologies, open questions and 
possible solutions. They also include a mini-roadmap detailing where the
 community should direct efforts in order for the phenomena to be viable
 for application and the challenges associated with meeting that 
performance threshold. Perspectives are characterized by personal 
viewpoints and opinions of recognized experts in the field.
Fast Track articles are invited original research articles that 
report results that are particularly novel and important or provide a 
significant advancement in an emerging field. Because of the urgency and
 scientific importance of the work, the peer review process is 
accelerated. If, during the review process, it becomes apparent that the
 paper does not meet the Fast Track criterion, it is returned to a 
normal track.
Topics covered in APL are diverse and reflect the most important subjects in applied physics, including:
Photonics and optoelectronics
Surfaces and interfaces
Advanced materials
Semiconductors
Magnetics and spintronics
Superconductivity and superconducting electronics
Dielectrics, ferroelectrics, and multiferroics
Nanoscale science and technology
Organic electronics and photonics
Device physics
Biophysics, biomaterials, liquids and soft matter
Energy conversion and storage
Interdisciplinary and general physics
Quantum materials and quantum technologies

Lesley F. Cohen, Imperial College London, London, UK
Alexander A. Balandin, University of California-Riverside, CA, USA
Qing Hu, Massachusetts Institute of Technology, Cambridge, MA, USA
Xiuling Li, University of Illinois, Urbana, IL, USA
Maria Antonietta Loi, University of Groningen, Groningen, Netherlands
David Long Price, CNRS-Centre de Recherche sur les Matériaux à Haute Température, Orleans, France

Associate Editors
Andrea Alù  (The City College Of New York, NY, USA)
Samuel D. Bader (Argonne National Laboratory, Argonne, IL, USA)
Dongmin Chen (Peking University, Beijing, China)
Christoph H. Grein (University of Illinois at Chicago, Chicago, IL, USA)
David S. Kupperman (Argonne National Laboratory, Argonne, IL, USA)
Roger K. Lake (University of California Riverside, Riverside, CA)
Liang-Sheng Liao (Institute of Functional Nano and Soft Materials, Soochow University, China)
Minn-Tsong Lin (National Taiwan University, Taipei, Taiwan)
Kenjiro Miyano (National Institute for Materials Science, Tsukuba, Japan)
Paul R. Okamoto (Argonne National Laboratory, Argonne, IL, USA)
Lynn E. Rehn (Argonne National Laboratory, Argonne, IL, USA)
Marie-Louise Saboungi (CNRS- Institut de Minéralogie, de Physique des Matériaux, et de Cosmochimie, Paris, France)
Mathias Schubert (University of Nebraska–Lincoln, Lincoln, NE)
Alessandro Tredicucci (Pisa University, Pisa, Italy)
Susan E. Trolier-McKinstry (Pennsylvania State University, University Park, PA, USA)
Emanuel Tutuc (University of Texas at Austin, Austin, TX)
Martin Weides (University of Glasgow, Glasgow, UK)
Wenqing Zhang (Southern University of Science and Technology in Shenzhen, China)
Hongping Zhao (The Ohio State University, OH, USA)