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个人简介

教育经历 1983.9 -- 1986.7 大连工学院 理论物理 硕士 1979.8 -- 1983.8 阜阳师范学院 物理 学士 工作经历 1994.12 -- 至今 物理与光电工程学院 教授 1991.8 -- 1994.11 物理系 副教授 1988.3 -- 1991.7 物理系 讲师 1986.7 -- 1988.3 物理系 助教

研究领域

离子束及电磁波与物质相互作用 大功率负氢离子源物理 等离子体工艺腔室的多场耦合理论及仿真 射频容性耦合等离子体物理 射频感性耦合等离子体物理

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Hu, Zhang-Hu,Wang, Xiao-Juan,Hui, De-Xuan,Zhao, Quan-Tang,Cheng, Rui,Zhao, Yong-Tao,Zhang, Zi-Min,Wang, You-Nian.Gamma-ray beam produced by a plasma lens focused electron bunch[J],PHYSICS OF PLASMAS,2020,27(2) Liu, Jian-Kai,Zhang, Yu-Ru,Zhao, Kai,Wen, De-Qi,Wang, You-Nian.Simulations of electromagnetic effects in large-area high-frequency capacitively coupled plasmas with symmetric electrodes: Different axial plasma density profiles[J],PHYSICS OF PLASMAS,2020,27(2) Zou, Hao,Zhang, Lisong,Guan, Tong,Zhang, Xiaonan,Remnev, Gennady E.,Pavlov, Sergey K.,Wang, Younian,Mei, Xianxiu.Effect on mechanics properties and microstructure of molybdenum by high intensity pulsed ion beam irradiation[J],SURFACE & COATINGS TECHNOLOGY,2020,384 Hui, De-Xuan,Hu, Zhang-Hu,Zhao, Yong-Tao,Cheng, Rui,Mei, Xian-Xiu,Wang, You-Nian.Modulation of ion beams in two-component plasmas: Three-dimensional particle-in-cell simulation[J],PHYSICS OF PLASMAS,2019,26(9) Wen, Ying-Ying,Zhang, Yu-Ru,Jiang, Ge,Song, Yuan-Hong,Wang, You-Nian.Secondary electron effect on sustaining capacitively coupled discharges: A hybrid modeling investigation of the ionization rate[J],AIP ADVANCES,2019,9(5) Li, Chun-Zhi,Na, Su-Ri,Jian, Yang-Yang,Wang, You-Nian,Miskovic, Z. L..Interactions of the external charged particle beams with double-layer two-dimensional electron gases separated by insulating medium[J],RADIATION EFFECTS AND DEFECTS IN SOLIDS,2019,174(1-2):19-30 Sun, Jing-Yu,Wen, De-Qi,Zhang, Quan-Zhi,Liu, Yong-Xin,Wang, You-Nian.The effects of electron surface interactions in geometrically symmetric capacitive RF plasmas in the presence of different electrode surface materials[J],PHYSICS OF PLASMAS,2019,26(6) 高飞,王友年.Experimental investigation of the electron impact excitation behavior in pulse-modulated radio frequency Ar/O2 inductively coupled plasma[J],J. Appl. Phys.,2019,125:23303-23303 左春彦,高飞,戴忠玲,王友年.高功率微波输出窗内侧击穿动力学的PIC/MCC模拟研究[J],物理学报,2018,22:340-350 胡艳婷,张钰如,宋远红,王友年.相位角对容性耦合电非对称放电特性的影响[J],物理学报,2018,67(22):288-300 Wang, Xiao-Juan,Hu, Zhang-Hu,Zhao, Yong-Tao,Wang, You-Nian.Modulation of proton beams by relativistic electron beam-plasma instability[J],PHYSICS OF PLASMAS,2018,25(10) Li, Jian-quan,Lu, Wen-qi,Xu, Jun,Gao, Fei,Wang, You-nian.A comparative study of emissive probe techniques for vacuum space potential measurements[J],VACUUM,2018,155:566-571 Yang, Wei,Li, Hong,Gao, Fei,Wang, You-Nian.A global model study of the population dynamics of molecular hydrogen and the generation of negative hydrogen ions in low-pressure ICP discharge with an expansion region: effects of EEPF[J],PLASMA SOURCES SCIENCE & TECHNOLOGY,2018,27(7) Han, Dao-Man,Liu, Yong-Xin,Gao, Fei,Wang, Xiang-Yu,Li, Ang,Xu, Jun,Jing, Zhen-Guo,Wang, You-Nian.Observation of the standing wave effect in large-area, very-high-frequency capacitively coupled plasmas by using a fiber Bragg grating sensor[J],JOURNAL OF APPLIED PHYSICS,2018,123(22) Han, Dao-Man,Liu, Yong-Xin,Gao, Fei,Liu, Wen-Yao,Xu, Jun,Wang, You-Nian.Measurements of argon metastable density using the tunable diode laser absorption spectroscopy in Ar and Ar/O-2[J],CHINESE PHYSICS B,2018,27(6) Zhang, Yu-Ru,Hu, Yan-Ting,Gao, Fei,Song, Yuan-Hong,Wang, You-Nian.Plasma characteristics in an electrically asymmetric capacitive discharge sustained by multiple harmonics: operating in the very high frequency regime[J],PLASMA SOURCES SCIENCE & TECHNOLOGY,2018,27(5) Xue, Chan,Gao, Fei,Liu, Yong-Xin,Liu, Jia,Wang, You-Nian.Phase shift effects of radio-frequency bias on ion energy distribution in continuous wave and pulse modulated inductively coupled plasmas[J],CHINESE PHYSICS B,2018,27(4) Li, Jianquan,Lu, Wenqi,Xu, Jun,Gao, Fei,Wang, Younian.Automatic emissive probe apparatus for accurate plasma and vacuum space potential measurements[J],PLASMA SCIENCE & TECHNOLOGY,2018,20(2) Liu, Gang-Hu,Liu, Yong-Xin,Bai, Li-Shui,Zhao, Kai,Wang, You-Nian.Experimental investigation of mode transitions in asymmetric capacitively coupled radio-frequency Ne and CF4 plasmas[J],PHYSICS OF PLASMAS,2018,25(2) Gao, Fei,Li, Hong,Yang, Wei,Liu, Jia,Zhang, Yu-Ru,Wang, You-Nian.Experimental and numerical investigations of electron characteristics in 2 MHz and 13.56 MHz inductively coupled hydrogen plasmas with an expansion region[J],PHYSICS OF PLASMAS,2018,25(1) 高飞,王友年.Experimental investigation of the electron impact excitation behavior in pulse-modulated radio frequency Ar/O2 inductively coupled plasma[J],J. Appl. Phys.,2018,125:23303-23303 张小楠,梅显秀,曹兴忠,王友年,孙建荣,郑鹏飞.The effect of He ions irradiation on the micro-structure and propertyof CLF-1 steel[J],JOURNAL OF NUCLEAR MATERIALS, 509(2018) 496-503,2018,509(509):496-503 梅显秀,张琪,张小楠,王英敏,王友年.High Intensity Pulsed Ion Beam Irradiation for tructural Stability of Metallic Glass Ni62Ta38[J],IEE TRANSACITIONS ON PLASMA SCIENCE, 46 (2018)2800-2804,2018,46(46):2800-2804 刘永新,王友年.Measurements of argon metastable density using the tunable diode laser absorption spectroscopy in Ar and Ar/O2[J],Chin. Phys. B .,2018,27(6):65202-65202 张钰如,宋远红,王友年.Effect of phase angle on plasma characteristics in electrically asymmetric capacitive discharge[J],Acta Phys. Sin.,2018,67(22):225203- 董婉,王喜凤,宋远红,戴忠玲,王友年.Effect of plasma uniformity on etching profiles[A],The 71st Annual Gaseous Electronics Conference,2018 戴忠玲,董婉,宋远红,王友年. Effect of ion bombardment time on the profile of atomic layer etching[A],2nd Asia-Pacific Conference on Plasma Physics,2018 董婉,戴忠玲,宋远红,王友年.ALE of SiO2 by alternating CF4 plasma with energetic Ar+ plasma beams[A],7th international conference on microelectronics and plasma technology,2018 左春彦,高飞,戴忠玲,王友年.高功率微波输出窗内侧击穿动力学的PIC/MCC 模拟研究[J],物理学报,2018,67(22):267-278 Wen, De-Qi,Kawamura, E.,Lieberman, M. A.,Lichtenberg, A. J.,Wang, You-Nian.Two-dimensional particle-in-cell simulations of standing waves and wave-induced hysteresis in asymmetric capacitive discharges[J],JOURNAL OF PHYSICS D-APPLIED PHYSICS,2017,50(49) Hu, Zhang-Hu,Wang, Xiao-Juan,Zhao, Yong-Tao,Wang, You-Nian.Double-ring structure formation of intense ion beams with finite radius in a pre-formed plasma[J],PHYSICS OF PLASMAS,2017,24(12) Li, Jian-Quan,Lu, Wen-Qi,Xu, Jun,Gao, Fei,Wang, You-Nian.Automatic emissive probe apparatus for efficient plasma potential measurements[J],REVIEW OF SCIENTIFIC INSTRUMENTS,2017,88(11):115106 张琪,梅显秀,张小楠,马雪,王友年.Ar12+离子辐照对金属玻璃和金属钨表面微观结构和性能的影响[J],中国表面工程,2017,30(5):36-43 Zhang, Ying-Ying,Song, Yuan-Hong,Radovic, Ivan,Miskovic, Zoran L.,Wang, You-Nian.Interactions of moving charged particles with triple-walled carbon nanotubes[J],EUROPEAN PHYSICAL JOURNAL D,2017,71(8) Wen, De-Qi,Kawamura, E.,Lieberman, M. A.,Lichtenberg, A. J.,Wang, You-Nian.A nonlinear electromagnetics model of an asymmetrically-driven, low pressure capacitive discharge[J],PHYSICS OF PLASMAS,2017,24(8) Ma, Xiaoqin,Zhang, Saiqian,Dai, Zhongling,Wang, Younian.Study on atomic layer etching of Si in inductively coupled Ar/Cl-2 plasmas driven by tailored bias waveforms[J],PLASMA SCIENCE & TECHNOLOGY,2017,19(8,SI) 温莹莹,张钰如,王友年.二次电子对容性耦合等离子体的影响[A],第十八届全国等离子体科学技术会议,2017,1 王晓娟,胡章虎,王友年.强流离子束在等离子体中电流及电荷中和的粒子模拟研究[A],第十八届全国等离子体科学技术会议,2017,1 Gao, Fei,Zhang, Yu-Ru,Li, Hong,Liu, Yang,Wang, You-Nian.Spatial distributions of plasma parameters in inductively coupled hydrogen discharges with an expansion region[J],PHYSICS OF PLASMAS,2017,24(7) Liu, Yong-Xin,Korolov, Ihor,Schungel, Edmund,Wang, You-Nian,Donko, Zoltan,Schulze, Julian.Striations in electronegative capacitively coupled radio-frequency plasmas: Effects of the pressure, voltage, and electrode gap[J],PHYSICS OF PLASMAS,2017,24(7) Bi, Zhen-Hua,Hong, Yi,Lei, Guang-Jiu,Wang, Shuai,Wang, You-Nian,Liu, Dong-Ping.Influence of a centered dielectric tube on inductively coupled plasma source: Chamber structures and plasma characteristics[J],CHINESE PHYSICS B,2017,26(7) Zhang, Xiaonan,Mei, Xianxiu,Zhang, Qi,Li, Xiaona,Qiang, Jianbing,Wang, Younian.Damage induced by helium ion irradiation in Fe-based metallic glass[J],JOURNAL OF NUCLEAR MATERIALS,2017,490:216-225 高飞,李宏,刘阳,杨唯,张钰如,王友年.大功率低气压射频感性耦合负氢离子源中电子特性的研究[A],第十八届全国等离子体科学技术会议,2017,1 胡章虎,王友年,赵永涛.强流离子束在等离子体中的输运过程及高次谐波的激发[A],第十八届全国等离子体科学技术会议,2017,1 梁英霜,刘永新,王友年.容性耦合氮/氩等离子体的流体力学模拟与实验验证[A],第十八届全国等离子体科学技术会议,2017,1 张钰如,王友年.等离子体催化过程中微放电的模拟研究[A],第十八届全国等离子体科学技术会议,2017,1 刘永新,赵凯,温德奇,刘刚虎,李宏,高飞,张钰如,宋远红,王友年.低气压射频等离子体研究进展[A],第十八届全国等离子体科学技术会议,2017,1 张赛谦,杨雪,戴忠玲,王友年.反应物输运与Ar/C4F8等离子体中SiO2刻蚀的精度控制[A],第十八届全国等离子体科学技术会议,2017,1 左春彦,温德奇,高飞,王友年.高功率微波输出窗内等离子体产生过程PIC/MC模拟研究[A],第十八届全国等离子体科学技术会议,2017,1 李宏,张钰如,高飞,王友年.射频负氢离子源放电特性的Langmuir探针诊断研究[A],第十八届全国等离子体科学技术会议,2017,1 胡艳婷,张钰如,王友年.甚高频放电中电磁效应与电非对称效应对径向均匀性的影响[A],第十八届全国等离子体科学技术会议,2017,1 白立水,刘永新,王友年.脉冲调制容性耦合等离子体中高能电子动力学研究[A],第十八届全国等离子体科学技术会议,2017,1 韩道满,高飞,刘永新,徐军,王友年.甚高频大面积容性放电中电磁效应的实验研究[A],第十八届全国等离子体科学技术会议,2017,1 刘刚虎,刘永新,高飞,王友年.容性耦合CF4等离子体中二次电子对电子加热模式的影响[A],第十八届全国等离子体科学技术会议,2017,1 刘慧,李雪春,王友年.脉冲调制常压射频介质阻挡氩氧混合放电特性模拟研究[A],第十八届全国等离子体科学技术会议,2017,1 赵凯,李永新,王友年.双频容性耦合Ar放电驻波效应实验研究:低频源的影响[A],第十八届全国等离子体科学技术会议,2017,1 薛婵,高飞,张钰如,王友年.感性耦合等离子体中射频偏压相位对离子能量分布的影响[A],第十八届全国等离子体科学技术会议,2017,1 王喜凤,宋远红,戴忠玲,王友年.射频容性耦合SiH4/Ar放电中反转电场及电子能量分布的模拟[A],第十八届全国等离子体科学技术会议,2017,1 Li, Hong,Liu, Yang,Zhang, Yu-Ru,Gao, Fei,Wang, You-Nian.Nonlocal electron kinetics and spatial transport in radio-frequency two-chamber inductively coupled plasmas with argon discharges[J],JOURNAL OF APPLIED PHYSICS,2017,121(23) Liu, Yong-Xin,Korolov, Ihor,Schuengel, Edmund,Wang, You-Nian,Donko, Zoltan,Schulze, Julian.Striations in electronegative capacitively coupled radio-frequency plasmas: analysis of the pattern formation and the effect of the driving frequency[J],PLASMA SOURCES SCIENCE & TECHNOLOGY,2017,26(5) Wen, De-Qi,Zhang, Yu-Ru,Lieberman, Michael A.,Wang, You-Nian.Ion Energy and Angular Distribution in Biased Inductively Coupled Ar/O-2 Discharges by Using a Hybrid Model[J],PLASMA PROCESSES AND POLYMERS,2017,14(4-5,SI) Liang, Ying-Shuang,Liu, Gang-Hu,Xue, Chan,Liu, Yong-Xin,Wang, You-Nian.Fluid simulation of species concentrations in capacitively coupled N-2/Ar plasmas: Effect of gas proportion[J],JOURNAL OF APPLIED PHYSICS,2017,121(20) Xue, Chan,Wen, De-Qi,Liu, Wei,Zhang, Yu-Ru,Gao, Fei,Wang, You-Nian.Experimental and numerical investigations on time-resolved characteristics of pulsed inductively coupled O-2/Ar plasmas[J],JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A,2017,35(2) 梅显秀,王友年.Ar12+离子辐照对金属玻璃和金属钨表面微观结构[J],中 国 表 面 工 程,2017,30:36-43 梅显秀,王友年.Effect on structure and mechanical property of tungsten irradiated by[J],Nuclear Instruments and Methods in Physics Research B 406 (2017) 697–702,2017,406:697-702 梅显秀,李晓娜,王英敏,王友年.Study of irradiation damage induced by He2+ion irradiation in Ni62Ta38metallic glass and W metal[J],Nuclear Instruments and Methods in Physics Research, Section B,2017,406:548-554 戴忠玲,王友年.Study on atomic layer etching of Si in inductively coupled Ar/Cl2 plasmas driven by tailored bias waveforms[J],Plasma Sci. Technol.,2017,19(6):85502-85502 张钰如,王友年.Ion Energy and Angular Distribution in Biased Inductively Coupled Ar/O2 Discharges by Using a Hybrid Model[J],PLASMA PROCESSES AND POLYMERS,2017,14:1600100- 刘永新,王友年.Fluid simulation of species concentrations in capacitively coupled N2/Ar plasmas: Effect of gas proportion[J],Journal of Applied Physics,2017,121(20):203302-203302 戴忠玲,王友年.Numerical study of atomic layer precision control for SiO2 etching[A],the 70th Annual Gaseous Electronics Conference, November 6-10, 2017, in Pittsburgh, PA, U.S.A.,2017 戴忠玲,王友年.Accuracy control of SiO2 etching in inductively coupled CF4/Ar plasmas[A],1st Asia-Pacific Conference on Plasma Physics, 18-23, 09.2017,2017 梅显秀,李晓娜,王英敏,王友年.Study of irradiation damage induced by He2+ ion irradiation in Ni62Ta38[J],Nuclear Instruments and Methods in Physics Research B 406 (2017) 548–554,2017,406:548-554 Wen, De-Qi,Kawamura, E.,Lieberman, M. A.,Lichtenberg, A. J.,Wang, You-Nian.Nonlinear series resonance and standing waves in dual-frequency capacitive discharges[J],PLASMA SOURCES SCIENCE & TECHNOLOGY,2017,26(1) Sun, Xiao-Yan,Zhang, Yu-Ru,Li, Xue-Chun,Wang, You-Nian.Fluid simulation of the pulsed bias effect on inductively coupled nitrogen discharges for low-voltage plasma immersion ion implantation[J],CHINESE PHYSICS B,2017,26(1) 张钰如,高飞,王友年.Experimental and numerical investigations on time-resolved characteristics of pulsed inductively coupled O2/Ar plasmas[J],Journal of Vacuum Science & Technology A,2017,35(2):21301-21301 Zhao, Kai,Liu, Yong-Xin,Gao, Fei,Liu, Gang-Hu,Han, Dao-Man,Wang, You-Nian.Experimental investigations of the plasma radial uniformity in single and dual frequency capacitively coupled argon discharges[J],PHYSICS OF PLASMAS,2016,23(12) Yang, Wei,Li, Hong,Gao, Fei,Wang, You-Nian.Hybrid simulations of solenoidal radio-frequency inductively coupled hydrogen discharges at low pressures[J],PHYSICS OF PLASMAS,2016,23(12) Wang, Shuai,Long, Hai-Feng,Bi, Zhen-Hua,Jiang, Wei,Xu, Xiang,Wang, You-Nian.One-dimensional hybrid simulation of the electrical asymmetry effect caused by the fourth-order harmonic in dual-frequency capacitively coupled plasma[J],CHINESE PHYSICS B,2016,25(11) Li, Jian-quan,Xu, Jun,Bai, Yu-jing,Lu, Wen-qi,Wang, You-nian.Improved inflection point method of emissive probe for accurate measurement of plasma potential[J],JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A,2016,34(6) Hou, Wenjing,Mei, Xianxiu,Zhang, Xiaonan,Wang, Yingmin,Qiang, Jianbing,Sun, Jianrong,Wang, Younian.Resistance to He2+ irradiation damage in metallic glass Ta38Ni62[J],APPLIED SURFACE SCIENCE,2016,383:106-112

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