Chang, Jane P - University of California, Los Angeles - Department of Chemical and Biomolecular Engineering

个人简介

Education B.S. National Taiwan University, 1993. M.S. Massachusetts Institute of Technology, 1995 Ph.D. Massachusetts Institute of Technology, 1998. Awards Rumbel Fellowship, MIT, 1993. AVS Coburn and Winters Award, 1996. NSF Faculty Career Award, 2000-2004. Chancellor’s Career Development Award, 2000-2004. William F. Seyer Chair in Materials Electrochemistry, 2000-. TRW Excellence in Teaching Award, 2002. ONR Young Investigator Award, 2003. Teacher of the Year, Chemical Engineering, UCLA, 2003. Professor of the Year, Chemical Engineering, UCLA, 2004 AVS Peter Mark Award, 2005 Professor of the Year, Chemical Engineering, UCLA, 2009

研究领域

Plasma chemistries and surface kinetics, atomic layer deposition of complex and multifunctional oxide materials, semiconductor processing and chemistry, computational surface chemistry, nanostructured complex oxides

近期论文

查看导师最新文章（温馨提示：请注意重名现象，建议点开原文通过作者单位确认）

M. Sawkar-Mathur and J.P. Chang, “Material and electrical properties of sputter-deposited HfxRuy and HfxRuyNz metals as gate electrodes for p-metal oxide semiconductors field effect transistors devices”, Journal of Applied Physics, 104, 084101, (2008) J. Hoang, C.C. Hsu and J.P. Chang, “Feature profile evolution during shallow trench isolation etch inchlorine-based plasmas. I. Feature scale modeling”, J. Vac. Sci. Technol. B., 26 (6), 2008. C.C. Hsu, J. Hoang, V. Le and J.P. Chang, “Feature profile evolution during shallow trench isolation etch inchlorine-based plasmas. II. Coupling reactor and feature scale models”, J. Vac. Sci. Technol. B., 26 (6), 2008. M. Sawkar-Mathur, S. Perng, J. Lu, H.-O. Blom, J. Bargar, and J. P. Chang, “The effect of aluminum oxide incorporation on the material and electrical properties of hafnium oxide on Ge,” Applied Physics Letters, 93, 233501 (2008). J. Liu, Y. Mao, E. Lan, D. R. Banatao, G. J. Forse, J. Lu, H.-O. Blom, T. O. Yeates, B. Dunn, and J. P. Chang, “Generation of Oxide Nano-Patterns by Combining Self-Assembly of S-Layer Proteins and Area Selective Atomic Layer Deposition,” Journal of American Chemical Society, 130 (50), 16908-16913 (2008). R. M. Martin and J. P. Chang, “Plasma Etching of Hf-based High-k Thin Films, Part I: Effect of Complex Ions and Radicals on the Surface Reactions,” Journal of Vacuum Science and Technology A 27(2), 209-216 (2009). R. M. Martin, H.-O. Blom, and J. P. Chang, “Plasma Etching of Hf-based High-k Thin Films, Part II: Ion-enhanced Surface Reaction Mechanisms,” Journal of Vacuum Science and Technology A 27(2), 217-223 (2009). R. M. Martin and J. P. Chang, “Plasma Etching of Hf-based High-k Thin Films, Part III: Modeling the Reaction Mechanisms,” Journal of Vacuum Science and Technology A 27(2), 224-229 (2009).