当前位置: X-MOL首页全球导师 海外导师 › Sharp, Ian

研究领域

The Sharp Group at the Walter Schottky Institute is devoted to fabrication and characterization of functional semiconductors and catalysts, as well as their interfaces, for applications in renewable energy conversion. A current emphasis of the group is on the discovery and development of materials and combinations of materials for driving photochemical reactions. Deposition of a range of nitride, oxynitride, and oxide thin films and nanostructures is accomplished in our group using techniques including atomic layer deposition, molecular beam epitaxy, and physical vapor deposition. These approaches allow us to precisely control the composition, structure, and phase of materials in order to elucidate energy conversion mechanisms and direct functional properties. To explore material interactions, defect properties, and chemical transformations at semiconductor-based solid/solid and solid/liquid interfaces, we utilize a suite of spectroscopic and microscopic characterization tools. Ongoing work includes fundamental studies of electronic structure and charge carrier dynamics in semiconductor photoelectrodes, investigation of interfacial phenomena in heterostructured materials, and development of multi-functional thin films that balance optical, electronic, and chemical properties.

近期论文

查看导师最新文章 (温馨提示:请注意重名现象,建议点开原文通过作者单位确认)

Real-Time Investigation of Sulfur Vacancy Generation and Passivation in Monolayer Molybdenum Disulfide via in situ X-ray Photoelectron Spectromicroscopy ACS Nano in press (2022)T. Grünleitner, A. Henning, M. Bissolo, M. Zengerle, L. Gregoratti, M. Amati, P. Zeller, J. Eichhorn, A.V. Stier, A.W. Holleitner, J.J. Finley, I.D. Sharp Spatially-Modulated Silicon Interface Energetics via Hydrogen Plasma-Assisted Atomic Layer Deposition of Ultrathin Alumina Advanced Materials Interfaces in press (2022)A. Henning, J.D. Bartl, L. Wolz, M. Christis, F. Rauh, M. Bissolo, T. Grünleitner, J. Eichhorn, P. Zeller, M. Amati, L. Gregoratti, J.J. Finley, B. Rieger, M. Stutzmann, I.D. Sharp Using Metal−Organic Frameworks to Confine Liquid Samples for Nanoscale NV-NMR Nano Letters in press (2022)K.S. Liu, X. Ma, R. Rizzato, A.L. Semrau, A. Henning, I.D. Sharp, R.A. Fischer, D.B. Bucher Tandem electrocatalytic CO2 reduction with Fe-porphyrins and Cu nanocubes enhances ethylene production Chem. Sci. 13, 12673 (2022)M. Wang, V. Nikolaou, A. Loiudice, I.D. Sharp, A. Llobet, R. Buonsanti Emerging noble-metal-free Mo-based bifunctional catalysts for electrochemical energy conversion Nano Research 15, 10234 (2022)S. Santra, V. Streibel, I.D. Sharp Catalytic Metasurfaces Empowered by Bound States in the Continuum ACS Nano 16, 13057 (2022)H. Hu, T. Weber, O. Bienek, A. Wester, L. Hüttenhofer, I.D. Sharp, S.A. Maier, A. Tittl, E. Cortés Optically Induced Long-Lived Chirality Memory in the Color-Tunable Chiral Lead-Free Semiconductor (R)/(S)-CHEA4Bi2BrxI10–x (x = 0–10) J. Am. Chem. Soc. 144, 14079 (2022)S. Liu, M.W. Heindl, N. Fehn, S. Caicedo-Dávila, L. Eyre, S.M. Kronawitter, J. Zerhoch, S. Bodnar, A. Shcherbakov, A. Stadlbauer, G. Kieslich, I.D. Sharp, D.A. Egger, A. Kartouzian, F. Deschler Designing Multifunctional Cobalt Oxide Layers for Efficient and Stable Electrochemical Oxygen Evolution Advanced Materials Interfaces 9, 2200582 (2022)M. Kuhl, A. Henning, L. Haller, L.I. Wagner, C.-M. Jiang, V. Streibel, I.D. Sharp, J. Eichhorn Strong Induced Circular Dichroism in a Hybrid Lead-Halide Semiconductor Using Chiral Amino Acids for Crystallite Surface Functionalization Advanced Optical Materials 10, 2200204 (2022)M.W. Heindl, T. Kodalle, N. Fehn, L.K. Reb, S. Liu, C. Harder, M. Abdelsamie, L. Eyre, I.D. Sharp, S.V. Roth, P. Müller-Buschbaum, A. Kartouzian, C.M. Sutter-Fella, F. Deschler The 2022 Solar Fuels Roadmap J. Phys. D 55, 323003 (2022)G. Segev, J. Kibsgaard, C. Hahn, Z.J. Xu, W.-H. Cheng, T. Deutsch, C. Xiang, J.Z. Zhang, L. Hammarstrom, D. Nocera, A.Z. Weber, P. Agbo, T. Hisatomi, F. Osterloh, K. Domen, F.F. Abdi, S. Haussener, D. Miller, S. Ardo, P.C. McIntyre, T. Hannappel, S. Hu, H.A. Atwater, J. Gregoire, M.Z. Ertem, I.D. Sharp, K.-S. Choi, J.S. Lee, O. Ishitani, J.W. Ager, R. Ramanujam Prabhakar, A.T. Bell, S. Boettcher, K. Vincent, K. Takanabe, V. Artero, R. Napier, B. Roldan Cuenya, M. Koper, R. Van de Krol, F. Houle Solution-based synthesis of wafer-scale epitaxial BiVO4 thin films exhibiting high structural and optoelectronic quality Journal of Materials Chemistry A 10, 12026 (2022)V.F. Kunzelmann, C.-M. Jiang, I. Ihrke, E. Sirotti, T. Rieth, A. Henning, J. Eichhorn, I.D. Sharp Exploiting Heat Transfer to Achieve Efficient Photoelectrochemical CO2 Reduction under Light Concentration Energy and Environmental Science 15, 2061 (2022)T. Kistler, M.Y. Um, J.K. Cooper, I.D. Sharp, P. Agbo Surface NMR using quantum sensors in diamond PNAS 119, e2111607119 (2022)K.S. Liu, A. Henning, M.W. Heindl, R.D. Allert, J.D. Bartl, I.D. Sharp, R. Rizzato, D.B. Bucher Electronically Tunable Transparent Conductive Thin Films for Scalable Integration of 2D Materials with Passive 2D–3D Interfaces Advanced Functional Materials 32, 2111343 (2022)T. Grünleitner, A. Henning, M. Bissolo, A. Kleibert, C.A.F. Vaz, A.V. Stier, J.J. Finley, I.D. Sharp The Influence of CsBr on Crystal Orientation and Optoelectronic Properties of MAPbI3-Based Solar Cells ACS Applied Materials and Interfaces 14, 2958 (2022)Y. Zou, S. Yuan, A. Buyruk, J. Eichhorn, S. Yin, M.A. Reus, T. Xiao, S. Pratap, S. Liang, C.L. Weindl, W. Chen, C. Mu, I.D. Sharp, T. Ameri, M. Schwartzkopf, S.V. Roth, P. Müller-Buschbaum Modular Assembly of Vibrationally and Electronically Coupled Rhenium Bipyridine Carbonyl Complexes on Silicon J. Am. Chem. Soc. 143, 19505 (2021)J.D. Bartl, C. Thomas, A. Henning, M.F. Ober, G. Savasci, B. Yazdanshenas, P.S. Deimel, E. Magnano, F. Bondino, P. Zeller, L. Gregoratti, M. Amati, C. Paulus, F. Allegretti, A. Cattani-Scholz, J.V. Barth, C. Ochsenfeld, B. Nickel, I.D. Sharp, M. Stutzmann, B. Rieger Metasurface Photoelectrodes for Enhanced Solar Fuel Generation Advanced Energy Materials 11, 2102877 (2021)L. Hüttenhofer, M. Golibrzuch, O. Bienek, F.J. Wendisch, R. Lin, M. Becherer, I.D. Sharp, S.A. Maier, E. Cortés A self-healing catalyst for electrocatalytic and photoelectrochemical oxygen evolution in highly alkaline conditions Nature Comm. 12, 5980 (2021)C. Feng, F. Wang, Z. Liu, M. Nakabayashi, Y. Xiao, Q. Zeng, J. Fu, Q. Wu, C. Cui, Y. Han, N. Shibata, K. Domen, I.D. Sharp, Y. Li Indirect bandgap, optoelectronic properties, and photoelectrochemical characteristics of high-purity Ta3N5 photoelectrodes Journal of Materials Chemistry A 9, 20653 (2021)J. Eichhorn, S.P. Lechner, C.-M. Jiang, G. Folchi Heunecke, F. Munnik, I.D. Sharp Aluminum Oxide at the Monolayer Limit via Oxidant-Free Plasma-Assisted Atomic Layer Deposition on GaN Advanced Functional Materials 31, 2101441 (2021)A. Henning, J.D. Bartl, A. Zeidler, S. Qian, O. Bienek, C.-M. Jiang, C. Paulus, B. Rieger, M. Stutzmann, I.D. Sharp

推荐链接
down
wechat
bug