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研究领域

(1)功能无机纳米材料的研究 磁性氧化铁如Fe3O4和g-Fe2O3,在磁记录材料、靶向给药系统、催化、磁流体、生物医学等方面具有广阔的应用前景。因此其制备方法已成为材料科学领域的研究热点之一。虽然人们研究和开发了不少合成这些氧化铁纳米粒子的方法,但还不能满足新的需求。尤其是应用于生物医学领域的磁性氧化铁纳米粒子需要比较苛刻的特性,包括低毒性、良好的磁性、颗粒大小分布均匀、表面容易被修饰、良好的溶解性能等。最近我们课题组发现了一种直接从铁的尿素配合物制备Fe3O4和g-Fe2O3纳米粒子的简单方法。二氧化钛(TiO2)也是一个用途最广泛的功能材料;它是一个典型的光催化剂,因此人们对它的光催化性能进行了广泛的研究。而我们研究的是它对水中污染物的吸附性能,首次发现介孔TiO2对偶氮染料、氟离子、重金属有较强的吸附能力。 (2)煤系高岭土的活化技术及其水处理中的应用 主要包括以下几方面的内容:①煤系高岭土的活化新技术研究; ②煤系高岭土/g-Fe2O3纳米复合材料的制备及其对水中污染物的吸附性能研究; ③煤系高岭土/TiO2纳米复合材料的制备及其对水中污染物的吸附性能研究。 (3)半导体材料、半导体器件的研究 硅基晶体管绝缘膜(SiO2)的制备技术已成为制约大规模集成电路进一步发展的关键技术。我们课题组用化学氧化法首先在硅晶片表面上成功地制备了1-2纳米的优质SiO2超薄膜,为解决大规模集成电路的难题打开了局面。 不久又成功于厚度超过10纳米SiO2薄膜的制备。在这基础上把该方法推广到硅以外的半导体材料上;已经在SiC晶片表面上成功地制备了尺寸可控的SiO2薄膜。

近期论文

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“Magnetic modification of acid-activated kaolin: Synthesis, characterization, and adsorptive properties”Z. Gao, X. Li, H. Wu, S. Zhao, W. Deligeer, S. Asuha*Microporous and Mesoporous Materials, 2015, 202: 1-7 (SCI收录) “Modification of acid-activated kaolinite with TiO2 and its use for the removal of azo dyes”Y. Hai, X. Li, H. Wu, S. Zhao, W. Deligeer, S. Asuha*Applied Clay Science, 2015, 114: 558–567(SCI收录) “Nickel(II) Complexes Bearing 4-Arylimino-1,2,3-trihydroacridines: Synthesis, Characterization, and Ethylene Oligomerization”Shengdong Wang, Shizhen Du, Wenjuan Zhang,* Sin Asuha,* and Wen-Hua Sun ChemistryOpen, 2015, 4: 328 –334(SCI收录) “Synthesis and thermal decomposition of Cr-urea complex”M. L. Bai, S. Zhao, S. Asuha*Journal of Thermal Analysis and Calorimetry, 2014, 115: 255-258 (SCI收录) “Efficient removal of Congo red by magnetically separable mesoporous TiO2 modified with g-Fe2O3” M. Yu, S. Zhao, H. Wu, S. Asuha*Journal of Porous Materials, 2013, 20: 1353-1360 (SCI收录) “Water-soluble, mesoporous Fe3O4: synthesis, characterization, and properties”S. Asuha *, H. L. Wan, S. Zhao, W. Deligeer, H. Y. Wu, L. Song, O. Tegus Ceramics International, 2012, 38: 6579-6584. (SCI收录) “Synthesis of mesoporous maghemite with high surface area and its adsorptive properties”S. Asuha*, Y. M. Zhao, S. Zhao, W. Deligeer Solid State Sciences, 2012, 14: 833-839. (SCI收录) “Porous structure and Cr(VI) removal abilities of Fe3O4 prepared from Fe-urea complex”S. Asuha*, B. Suyala, S. Zhao Materials Chemistry and Physics, 2011, 129: 483-487. (SCI收录) “Direct synthesis of Fe3O4 nanopowder by thermal decomposition of Fe-urea complex and its properties”S. Asuha*, B. Suyala, X. Siqintana, S. Zhao Journal of Alloys and Compounds, 2011, 509: 2870-2873. (SCI收录) “Adsorption of methyl orange on mesoporous g-Fe2O3/SiO2 nanocomposites”W. Deligeer, Y. W. Gao, S. Asuha*Applied Surface Science, 2011, 257: 3524–3528. (SCI收录) “Adsorptive removal of methyl orange using mesoporous maghemite”S. Asuha*, Y. W. Gao, W. Deligeer, M. Yu, B. Suyala and S. Zhao Journal of Porous Materials, 2011, 18 (5): 581-587. (SCI收录) “Adsorption of methyl orange and Cr(VI) on mesoporous TiO2 prepared by hydrothermal method”S. Asuha*, X. G. Zhou, S. Zhao Journal of Hazardous Materials, 2010, 181: 204-210. (SCI收录) “One-pot synthesis of magnetite nanopowder and their magnetic properties” S. Zhao, S. Asuha*, Powder Technology, 2010, 197: 295-297. (SCI收录) “介孔TiO2的合成及其对氟离子的吸附性能研究” 周新革,赵斯琴,长山* 功能材料, 2010, 41,476-480. (EI收录) “Effects of synthetic routes of Fe-urea complex on the synthesis of g-Fe2O3 nanopowder” S. Asuha*, S. Zhao, X. H. Jin, M. M. Hai, H. P. Bao Applied Surface Science, 2009, 255: 8897-8901. (SCI收录) “Low temperature formation of SiO2 thin films by nitric acid oxidation of Si (NAOS) and application to thin film transistor (TFT) ” T. Matsumoto, Asuha, W.-B. Kim, M. Yamada, S. Imai, S. Terakawa, H. Kobayashi Microelectronic Engineering, 2009, 86: 1939-1941. (SCI收录) “One step synthesis of maghemite nanoparticles by direct thermal decomposition of Fe-urea complex and their properties” S. Asuha*, S. Zhao, H. Y. Wu, L. Song, O. Tegus Journal of Alloys and Compounds, 2009, 472: L23-L25. (SCI收录) “Preparation of g-Fe2O3 Nanopowders by Direct Thermal Decomposition of Fe-Urea Complex: Reaction Mechanism and Magnetic Properties” S. Zhao, H. Y. Wu, L. Song, O. Tegus, S. Asuha* Journal of Materials Science, 2009, 44: 926-930. (SCI收录) “Ultrathin SiO2 layer on atomically flat Si(111) surfaces with excellent electrical characteristics formed by nitric acid oxidation method” Woo-Byoung Kim, Asuha, Taketoshi Matsumoto, Hikaru Kobayashi Applied Physics Letters, 2008, 93: 072101. (SCI收录) “Properties of thick SiO2/Si structure formed at 120 °C by use of two-step nitric acid oxidation method”S. Imai, S. Mizushima, Asuha, W. –B. Kim, H. Kobayashi Applied surface science, 2008, 254: 8054-8058. (SCI收录) “Nitric acid method for fabrication of gate oxides in TFT”Shigeaki Mizushima, Shigeki Imai, Asuha, Masato Tanaka, Hikaru Kobayashi Applied surface science, 2008, 254: 3685-3689. (SCI收录) “Formation of 10–30 nm SiO2/Si structure with a uniform thickness at 120 °C by nitric acid oxidation method”Asuha, Sung-Soon Im, Masato Tanaka, Shigeki Imai, Masao Takahashi, Hikaru Kobayashi Surface Science, 2006, 600: 2523-2527, (SCI收录) “Formation of atomically smooth SiO2/SiC interfaces at ~ 120 °C by use of nitric acid oxidation method” S. Imai, M. Fujimoto, Asuha, M. Takahashi, H. Kobayashi Surface Science, 2006, 600: 547-550. (SCI收录) “Nitric acid oxidation of silicon at ~ 120 °C to form 3.5-nm SiO2/Si structure with good electrical characteristics” Asuha, S. Imai, M. Takahashi, and H. Kobayashi Applied Physics Letters, 2004, 85: 3783-3785. (SCI收录) “Postoxidation Annealing Treatments to Improve Si/Ultrathin SiO2 Characteristics Formed by Nitric Acid Oxidation” Asuha, Yueh-Ling Liu, Osamu Maida, Masao Takahashi, and Hikaru Kobayashi Journal of the Electrochemical Society, 2004, 151 (12): G824-G828. (SCI收录)

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