The mutual optical intensity (MOI) model is extended to the simulation of the interference pattern produced by extreme ultraviolet lithography with partially coherent light. The partially coherent X‐ray propagation through the BL08U1B beamline at Shanghai Synchrotron Radiation Facility is analysed using the MOI model and SRW (Synchrotron Radiation Workshop) method. The fringe intensity at the exposure area is not uniform but has similar envelope lines to Fresnel diffraction, which is explained by the diffraction from the finite grating modelled as a single aperture. By balancing the slit size and photon stop size, the fringe visibility, photon flux and intensity slope can be optimized. Further analysis shows that the effect of pink light on the aerial images is negligible, whereas the third‐harmonic light should be considered to obtain a balance between high fringe visibility and high flux. Two grating interference exposure experiments were performed in the BL08U1B beamline. The aerial image depth showed that the polymethyl methacrylate photoresist depth was determined by the X‐ray coherence properties.

中文翻译：

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在SSRF处通过软X射线干涉光刻光束线传播的部分相干光的分析

互光强度（MOI）模型扩展到了模拟，该干涉图样是由具有部分相干光的极端紫外线光刻产生的。使用MOI模型和SRW（同步辐射车间）分析了上海同步辐射设施通过BL08U1B光束线产生的部分相干X射线传播。） 方法。曝光区域的条纹强度不均匀，但具有与菲涅耳衍射相似的包络线，这可以通过有限光栅建模为单个孔径的衍射来解释。通过平衡狭缝尺寸和光子挡块尺寸，可以优化条纹可见度，光子通量和强度斜率。进一步的分析表明，粉红光对航拍图像的影响可以忽略不计，而应考虑三次谐波光，以在高条纹可见性和高通量之间取得平衡。在BL08U1B光束线上进行了两次光栅干扰曝光实验。航拍图像深度表明，聚甲基丙烯酸甲酯光致抗蚀剂的深度由X射线相干性决定。