Abstract
The optical properties of CdS0.9Mn0.1 thin film with different thicknesses (d = 300, 450, 600, 750, 900 and 1000 nm) were explored. The Swanepoel method was employed to calculate the thickness of the studied films. Analyses of the absorption spectra indicated the existence of allowed indirect and direct transition mechanism in the CdS0.9Mn0.1 thin films. Both the absorption coefficient and optical band gap decreased while Urbach energy increased as the film thickness increased. The Wimple–DiDomenico single oscillator model was used to describe the dispersion of the refractive index. The film thickness dependence of the dispersion parameters was studied. The optical dielectric constants, optical conductivity, electrical susceptibility, and non-liner optical parameters such as the refractive index, first-order susceptibility (\( \chi^{(1)} \)) and third-order susceptibility (\( \chi^{(3)} \)) were determined. The present results show that the film thickness is an important factor which affected the optical parameters.
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References
E.R. Shaaban, M. Abdel-Rahman, E.S. Yousef, and M.T. Dessouky, Thin Solid Films 515, 3810 (2007).
A. Zakery and S.R. Elliott, J. Non-Cryst. Solids 330, 1 (2003).
E.R. Shaaban, M.N. Salam, M. Mohamed, M.A. Abdel-Rahim, and A.Y. Abdel-Latief, J. Mater. Sci.: Mater. Electron. 28, 13379 (2017).
M. Kastner, Phys. Rev. Lett. 28, 355 (1972).
E.R. Shaaban, I. Kansal, and J.M.F. Ferreira, Phys. B: Condensed Matter 404, 3571 (2009).
E.R. Shaaban, M. Mohamed, M.N. Abd-el Salam, A.Y. Abdel-Latief, M.A. Abdel-Rahim, and E.S. Yousef, Opt. Mater 86, 318 (2018).
J. Savage, Infrared Opt. Mater. and their antireflection coatings, (Bristol: Hilger, 1985).
S.R. Elliott, Physics of Amorphous Materials, 2nd ed. (Essex: Longman, 1990).
A. Borghesi, G. Guizzetti, A. Sassella, M.G. Simeone, and S. Viticoli, Il Nuovo Cimento D 14, 33 (1992).
J. Coombs, A. Jongenelis, W. van Es-Spiekman, and B. Jacobs, J. Appl. Phys. 78, 4906 (1995).
J. Solis, C.N. Afonso, S. Hyde, N. Barry, and P.M. French, Phys. Rev. Lett. 76, 2519 (1996).
E. Shaaban, Philos. Mag. 88, 781 (2008).
J. Manifacier, J. Gasiot, and J. Fillard, J. Phys. E: Sci. Instrum. 9, 1002 (1976).
N. Phasook, S. Kamoldirok, and W. Yindeesuk, J. Phys.: Conf. Ser. 1144, 012009 (2018).
D.E. Aimouch, S. Meskine, A. Birsan, V. Kuncser, A. Zaoui, and A. Boukortt, Mater. Chem. Phys. 213, 249 (2018).
E. Shaaban, N. El-Kabnay, A. Abou-Sehly, and N. Afify, Phys. B 381, 24 (2006).
M. Ohring, Materials Science of Thin Films, 2nd ed. (Boston: Academic Press, 2001).
E.R. Shaaban, M.A. Kaid, E.S. Moustafa, and A. Adel, J. Phys. D Appl. Phys. 41, 125301 (2008).
K. Seshan, eds., Handbook of Thin Film Deposition, 3rd ed. (Amsterdam: Elsevier, 2012)ISBN 978-1-4377-7873-1.
R. Swanepoel, J. Phys. E: Sci. Instrum. 17, 896 (1984).
T.S. Moss, Optical Properties of Semiconductors (London: Butterworth, 1959).
E. Shaaban, A. Metawa, A. Almohammedi, H. Algarni, A. Hassan, G.A. Ali, and A. Ashour, Mater. Res. Express 5, 086402 (2018).
N. Revathi, P. Prathap, and K.T.R. Reddy, Solid State Sci. 11, 1288 (2009).
E.K. Shokr and M. Wakkad, J. Mater. Sci. 27, 1197 (1992).
R. Vahalová, L. Tichý, M. Vlček, and H. Tichá, Phys. Status Solidi 181, 199 (2000).
M. Mohamed, E. Shaaban, M.N. Abd-el Salam, A. Abdel-Latief, S.A. Mahmoud, and M. Abdel-Rahim, Optik 178, 1302 (2019).
E.R. Shaaban, et al., Optik 164, 527 (2018).
J. Tauc, Amorphous and Liquid Semiconductor (New York: Plenum, 1974), pp. 159–214.
R. Achour, B. Said, and B. Boubaker, J. Semicond. 34, 0930031 (2013).
E.R. Shaaban, M.N. Abd-el Salam, M. Mohamed, M.A. Abdel-Rahim, and A.Y. Abdel-Latief, J. Mater. Sci. Mater. Electron. 28, 13379–13390 (2017).
H. Hosni, S. Fayek, S. El-Sayed, M. Roushdy, and M. Soliman, Vacuum 81, 54 (2006).
N.A. Bakr, A. Funde, V. Waman, M. Kamble, R. Hawaldar, D. Amalnerkar, S. Gosavi, and S. Jadkar, Pramana 76, 519 (2011).
E.R. Shaaban, N. Afify, and A. El-Taher, J. Alloys Compd. 482, 400 (2009).
J.I. Pankove, Optical Processes in Semiconductors (New York: Courier Corporation, 1975).
F. Yakuphanoglu, A. Cukurovali, and I. Yilmaz, Opt. Mater. 27, 1363 (2005).
S. Wemple, Phys. Rev. B 7, 3767 (1973).
D. Singh, S. Kumar, R. Thangaraj, and T. Sathiaraj, Phys. B 408, 119 (2013).
H. Ticha and L. Tichy, J. Optoelectron. Adv. Mater. 4, 381 (2002).
F. Yakuphanoglu, A. Cukurovali, and İ. Yilmaz, Phys. B 353, 210 (2004).
S.H. Wemple, DiDomenico. Phys. Rev. B 3, 1338 (1971).
M. El-Hagary, M. Emam-Ismail, E. Shaaban, A. Al-Rashidi, and S. Althoyaib, Mater. Chem. Phys. 132, 581 (2012).
A. Walton and T. Moss, Proc. Phys. Soc. 81, 509 (1963).
H. Ticha and L. Tichy, J. Optoelectron. Adv. M. 4, 381 (2002).
E.R. Shaaban, M.M. Mahasen, M.M. Soraya, E.S. Yousef, S.A. Mahmoud, G.A.M. Ali, and H.A. Elshaikh, J. Am. Ceram. Soc. 102, 4067 (2019).
C.C. Wang, Phys. Rev. B 2, 2045 (1970).
S. Smolorz, F. Wise, and N. Borrelli, Opt. Lett. 24, 1103 (1999).
P. Sharma and S. Katyal, J. Appl. Phys. 107, 113527 (2010).
I. Zedan and M. El-Nahass, Appl. Phys. A 120, 983 (2015).
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Abdelraheem, A.M., Abd-Elrahman, M.I., Mohamed, M. et al. Linear and Non-linear Optical Parameters of Diluted Magnetic Semiconductor CdS0.9Mn0.1 Thin Film: Influence of the Film Thickness. J. Electron. Mater. 49, 1944–1956 (2020). https://doi.org/10.1007/s11664-019-07873-5
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DOI: https://doi.org/10.1007/s11664-019-07873-5