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A modified high-temperature vapour deposition technique for fabricating \(\hbox {CH}_{3}\hbox {NH}_{3}\hbox {PbI}_{3}\) thin films under an ambient atmosphere

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Abstract

A modified two-step deposition technique was performed by vapour depositing methylammonium iodide (MAI) on lead iodide \((\hbox {PbI}_{2})\) films to fabricate good quality methylammonium lead iodide (MAPI) thin films under an ambient atmosphere, and their properties were compared with conventional two-step solution processed MAPI thin films. Scanning electron microscopy results depicted that the MAI vapour-processed films have a uniform coverage and planar surface compared with the non-uniformly distributed granule-like morphology of the solution-processed MAPI film. X-ray diffraction results confirm that the vapour-processed films have better crystallinity compared to the conventional solution-processed MAPI thin films. An enhancement in the optical absorption and emission was observed for the vapour-processed films. The higher processing temperature of the modified-vapour deposition eliminates the effect of moisture during the ambient atmosphere processing of the MAPI films.

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Acknowledgements

The authors sincerely thank the Department of Science and Technology (DST), Government of India, for funding this research No. DST/TM/SERI/FR/90(G).

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Correspondence to S Moorthy Babu.

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Manobalaji, G., Pandiyarajan, M., Senthilkumar, M. et al. A modified high-temperature vapour deposition technique for fabricating \(\hbox {CH}_{3}\hbox {NH}_{3}\hbox {PbI}_{3}\) thin films under an ambient atmosphere. Bull Mater Sci 42, 276 (2019). https://doi.org/10.1007/s12034-019-1956-4

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  • DOI: https://doi.org/10.1007/s12034-019-1956-4

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