Elsevier

Applied Surface Science

Volume 633, 1 October 2023, 157642
Applied Surface Science

Full Length Article
Successive crystallization in indium selenide thin films for multi-level phase-change memory

https://doi.org/10.1016/j.apsusc.2023.157642Get rights and content

Highlights

  • Three resistance states with clear distinction are obtained in indium selenide phase-change thin films.

  • Amorphous indium selenide thin films crystallize at two different temperatures to form two crystalline phases.

  • Reversible switch between three resistance states as fast as 60 ns is implemented in In2Se3-based PCM cells.

  • Successive crystallization in indium selenide thin films is applicable to multi-level phase-change memory.

Abstract

Increasing the storage density of phase-change memory is a challenging subject towards the universal memory commercialization. Multi-level data storage can be implemented in phase-change memory cells by designing multiple stages of crystallization of phase-change materials, which is favorable to push forward the application of phase-change memory in storage-class memory and the emerging in-memory computing. Here, the structure and properties of In2Se3 phase-change thin films with multi-level phase transitions are investigated. The In2Se3 thin films changes resistance states twice upon heating with high crystallization temperature and good thermal stability. The amorphous In2Se3 thin films undergo partial crystallization of the Se phase followed by crystallization of the γ-In2Se3 phase, with successive stages of crystallization accounting for the three distinct levels of resistivity. The phase-change memory cell based on In2Se3 thin films shows a continuous switching process of high resistance state, intermediate resistance state and low resistance state with low drift coefficient in SET-RESET operations at a speed as fast as 60 ns, and the RESET power is as low as 311 pJ, indicating that the In2Se3 thin films have good performance of three-state storage property and can effectively improve the memory density.

Introduction

With the increasing amount of data to be processed in high-performance computing, artificial intelligence, and deep learning, traditional storage solutions face the challenge of insufficient performance, including high latency and limited capacity. To address this challenge, storage-class memory (SCM) has emerged as a next-generation memory solution that offers large capacity and fast access speed for storing massive amounts of data [1]. Among various SCM candidates, PCM exhibits non-volatile characteristic, excellent cycling endurance to 107 operations, promising scalability in sub-10 nm node and steady process maturity for 3D integrated circuits (3D-IC), which is more suitable for SCM requirements [2], [3], [4]. In PCM, high resistance state (HRS) of amorphous phase and low resistance state (LRS) of crystalline phase in phase-change materials are identified as binary logic ‘0′ and ‘1′, and the phase transition can be triggered reversibly by electric pulse or laser [5]. The switching process has been interpreted as a combination of both phase-change and electrolytic mechanisms [6]. PCM commonly uses chalcogenides from the Ge-Sb-Te ternary phase diagram, such as Ge2Sb2Te5 (GST), Sb2Te3, and GeTe. These materials possess properties that attract a significant amount of research aimed at optimizing memory performance. Among them, Sb2Te3 with growth-dominated crystallization has been leveraged for fast memory switching [7], [8]. Furthermore, recent research has shown that interfacial PCM, utilizing GeTe/Sb2Te3 superlattices, exhibits outstanding device performance and offers promising research value in terms of unconventional structural evolution [9], [10].

However, the general PCM cell only stores 1-bit binary data due to the phase-change mechanism, which is still insufficient for high density storage-class memory applications. Multi-level cell (MLC) technology enables higher bit density in the PCM cells, resulting in more cost-effective memory devices. The large resistivity contrast between the amorphous and crystalline phases favors the introduction of intermediate resistance states for storing two or more bits per cell. The ability to store information at multiple resistance states is based on the principle of partial crystallization of the phase-change materials, e.g., applying electrical programming pulses to control the ratio of crystallization [11], [12], [13]. Nevertheless, the reliability of multi-level storage in PCM is seriously challenged by the phenomenon of resistance drift and the impact of temperature because of the spontaneous structural relaxation of amorphous phase.

Designing multilayer phase-change thin films is an effective strategy to achieve partial crystallization for multi-level storage. By utilizing the difference in crystallization temperature and crystalline resistance of different phase-change layers, three resistance states can be generated in multilayer thin films for data storage [14], [15], [16], [17]. The limitation is, since there is single amorphous-crystalline phase transition in common phase-change materials, only one intermediate state can be obtained in multilayer thin films. In order to further increase the memory density, more resistance states need to be realized in the monolayer phase-change thin films. Actually, GST and Sb2Te3 materials have phase transitions from the amorphous phase to the cubic phase and then to the hexagonal phase upon heating. However, the difference in resistivity between the cubic and hexagonal phases of GST thin films is too small to realize multiple resistance states in PCM. This can be manifested in nanowire structures of GST [18]. Doping yttrium elements into Sb2Te3 can stabilize the metastable cubic phase structure and induce reversible cubic-to-hexagonal transition within the amorphous-crystalline transition [19], [20]. This optimization is also utilized to achieve advanced multi-level phase-change memory [21]. On the other hand, Liu et al [22] designed double crystallization stages in Zn-doped Sb70Se30 thin films and found the phase-change processes were mainly attributed to the crystallization of the Sb and ZnSb phases. The key point is to find chalcogenide compounds with the possibility of multiple phase transitions at different temperatures.

Indium selenide (In2Se3) has rich crystalline phase structures (α, β, γ and κ phases). Researchers have discovered that In2Se3 has room-temperature ferroelectricity at the two-dimensional scale [23] and realized ferroelectric memory applications based on two-dimensional In2Se3 materials [24]. The phase change characteristics of In2Se3 can also be used for PCM applications. Lee et al [25] found that amorphous In2Se3 films could be transformed to γ-In2Se3 phase upon heating. In the study of polymorphic transitions, Tao et al [26] reported for the first time the preparation of single-crystal In2Se3 thin layers using mechanical exfoliation and studied the α → β crystalline transformation of the thin layers and the corresponding electrical property changes. Drawing on the concept of crystalline-crystalline transitions in GeTe/Sb2Te3 superlattice, Choi et al [27] designed a two-dimensional In2Se3 stacked thin film device to realize the reversible transition of low resistance β-phase and high resistance γ-phase. In2Se3 has the potential for multi-level storage in PCM applications due to the significant difference in the band gap of crystalline phases, which can exhibit differences in resistivity. In this paper, the crystallization stages of amorphous In2Se3 thin films are studied in detail. The structural and property changes of In2Se3 phase-change thin films at different temperatures are analyzed, and the possibility of their use for multi-level phase-change memory is discussed.

Section snippets

Films preparation and characterization

Indium selenide thin films were deposited on SiO2/Si(1 0 0) substrates by radio frequency magnetron sputtering from In2Se3 (99.99%) targets. For comparison, GST thin films were also deposited from Ge2Sb2Te5 (99.99%) targets. The base pressure was 2.0 × 10-4 Pa, and the working pressure was set to 0.27 Pa with an argon flow rate of 30 SCCM. The sputtering power was 40 W for In2Se3 deposition and 20 W for GST deposition. At these parameters, the deposition rates of In2Se3 and GST thin films were

Result and discussion

Phase-change behavior of indium selenide thin films was investigated by measuring the resistance of thin films during heating process at the rate of 20 °C/min, as displayed in Fig. 1 (a). The hot stage was purged in an Ar atmosphere to prevent the oxidation of films. High resistance of ∼ 200 MΩ was measured at room temperature, and the resistance descended with the increasing temperature as semiconductor-like behavior. Commonly, phase-change materials shift from the high resistance state to the

Conclusions

The phase transition behavior of amorphous In2Se3 thin films is investigated. It is found that In2Se3 thin films have two stages of crystallization in the amorphous-crystalline phase transition, showing distinctly differentiated resistance states, and achieve stable multi-level storage in the phase-change memory cell as the medium. With 10-year retention temperatures as high as 209 °C, In2Se3 thin films have excellent amorphous thermal stability to meet the requirements of high-temperature

CRediT authorship contribution statement

Zhehao Xu: Conceptualization, Investigation, Methodology, Data curation, Formal analysis, Writing – original draft. Yukang Yuan: Data curation, Writing – review & editing. Sannian Song: Writing – review & editing. Zhitang Song: Writing – review & editing. Ruirui Liu: Writing – review & editing, Funding acquisition. Jiwei Zhai: Conceptualization, Writing – review & editing, Supervision, Project administration, Funding acquisition.

Declaration of Competing Interest

The authors declare that they have no known competing financial interests or personal relationships that could have appeared to influence the work reported in this paper.

Acknowledgments

The authors would like to acknowledge financial support from the Science and Technology Commission of Shanghai Municipality (Grant No. 19JC1416803) and the National Natural Science Foundation of China (Grant No. 61474083 and No. 62104150).

References (33)

  • H.Y. Cheng et al.

    3D cross-point phase-change memory for storage-class memory

    J. Phys. D Appl. Phys.

    (2019)
  • M. Le Gallo et al.

    An overview of phase-change memory device physics

    J. Phys. D: Appl. Phys.

    (2020)
  • X. Sun et al.

    Nanoscale bipolar electrical switching of Ge2Sb2Te5 phase-change material thin films

    Adv. Electron. Mater.

    (2017)
  • J. Feng et al.

    “Stickier”-surface Sb2Te3 templates enable fast memory switching of phase change material GeSb2Te4 with growth-dominated crystallization

    ACS Appl. Mater. Interfaces

    (2020)
  • H. Bryja et al.

    Epitaxial layered Sb2Te3 thin films for memory and neuromorphic applications

    2D Mater.

    (2021)
  • D. Terebenec et al.

    Improvement of phase-change memory performance by means of GeTe/Sb2Te3 superlattices

    Phys. Status Solidi-Rapid Res. Lett.

    (2021)
  • View full text