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Fabrication of ITO diffraction grating structure for infrared plasmonics by thermal nanoimprint lithography

  • Special Section: Regular Paper
  • International Symposium on Imaging, Sensing, and Optical Memory (ISOM’ 21), Kobe, Japan
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Abstract

Indium tin oxide (ITO) diffraction grating was fabricated on a polyimide (PI) film by using a combination of thermal nanoimprint lithography (NIL) process and radio frequency (RF) sputtering method. The thermal NIL process was used to transfer a line and space pattern to the PI film and then an ITO thin film with a thickness of several hundred nanometers was deposited on the patterned PI film. A polarized reflection spectrum showed a characteristic decrease in reflectance due to surface plasmon resonance in an infrared spectral region, which is similar to that of the grating fabricated directly on ITO film using focused ion beam lithography. The fabrication process proposed in this study can easily realize an ITO grating structure with a large area.

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Authors and Affiliations

  1. Department of Electronics, Kyoto Institute of Technology, Matsugasaki, Kyoto, Sakyo-ku, 606-8585, Japan

    Noriyuki Hasuike, Takeshi Maeda & Minoru Takeda

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  1. Noriyuki Hasuike
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  2. Takeshi Maeda
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  3. Minoru Takeda
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Correspondence to Noriyuki Hasuike.

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Hasuike, N., Maeda, T. & Takeda, M. Fabrication of ITO diffraction grating structure for infrared plasmonics by thermal nanoimprint lithography. Opt Rev 29, 450–455 (2022). https://doi.org/10.1007/s10043-022-00759-8

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  • DOI: https://doi.org/10.1007/s10043-022-00759-8

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