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Study of the Electron Density in an Inductively Coupled Plasma of Fluorine-Hydrogen-Argon Gas Mixture

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Abstract

In this paper, we present the results of non-contact measurements of electron density in an inductively coupled chemically active plasma at a pressure of 0.5 Torr. As a plasma-forming gas volatile compounds of halides BF3, SiF4, GeF4 mixed with hydrogen and argon were used. The electron density was determined by direct registration of the phase shift of the probing microwave radiation with a frequency of 58 GHz when passing through a cylindrical plasma layer. The method used makes it possible to increase the accuracy of measurements and level out the effects associated with the scattering and absorption of the useful signal by the plasma. It was experimentally shown that changing the content of argon and hydrogen in the ternary gas mixture (halogenide-hydrogen-argon) affects the electron density value in the discharge. Conclusions were drawn about the role of electron attachment to electronegative atoms and radicals as a mechanism for the loss of electrons in the studied low-pressure discharge in the presence of volatile fluorides.

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Acknowledgements

This study was supported by a grant from the Russian Science Foundation (Project No. 20-13-00035).

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Authors and Affiliations

  1. Federal Research Center, Institute of Applied Physics of the Russian Academy of Sciences (IAP RAS), Nizhny Novgorod, Russia

    Sergey Sintsov, Dmitry Mansfeld, Evgeny Preobrazhensky, Nikita Chekamrev, Mikhail Viktorov & Alexander Vodopyanov

  2. Federal State Budgetary Institution of Science, Institute of Chemistry of High-Purity Substances, G. G. Devyatykh of the Russian Academy of Sciences, Nizhny Novgorod, Russia

    Roman Kornev & Artur Ermakov

Authors
  1. Sergey Sintsov
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  2. Dmitry Mansfeld
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  3. Evgeny Preobrazhensky
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  4. Roman Kornev
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  5. Nikita Chekamrev
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  6. Mikhail Viktorov
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  7. Artur Ermakov
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  8. Alexander Vodopyanov
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Correspondence to Sergey Sintsov.

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Sintsov, S., Mansfeld, D., Preobrazhensky, E. et al. Study of the Electron Density in an Inductively Coupled Plasma of Fluorine-Hydrogen-Argon Gas Mixture. Plasma Chem Plasma Process 42, 1237–1247 (2022). https://doi.org/10.1007/s11090-022-10280-0

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