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Numerical Simulation and Experimental Investigation on Etching Process of Atmospheric Pressure Cold Plasma Jet with Shielding Gas

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Abstract

Atmospheric pressure cold plasma has the advantages of high reactive species content, free from the limitation of vacuum environment and low cost in polymer films pattern etching. However, due to the extension phenomenon of the jet, there are problems in the pattern etching, such as low processing accuracy and difficulty in process precise control. In this paper, an atmospheric pressure cold plasma jet diffusion limited etching model is established to simulate the etching process and surface etching morphology under different conditions, and a plasma jet processing platform is built for experimental confirmation. The effect of diffusion coefficient and move probability on the etching results is studied by numerical simulation. The experiment observes the extension phenomenon of the plasma jet hitting the glass slide under the influence of working voltage or nitrogen flow, and the color reaction of Starch-KI test paper. The results show that the simulated etching results are consistent with the extension phenomenon of the jet impinging on the glass slide. The greater the probability of the active particles moving downward, the greater the contact line width and the etching depth, which is the same as the experimental result of increasing the working voltage. The shielding gas can isolate the air, reduce the diffusion coefficient, and reduce the loss of particles, which is beneficial to plasma etching. It is hoped that the research results in this paper can provide a certain reference for realizing high-precision and controllable etching and process optimization of atmospheric pressure cold plasma jet.

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Funding

Project supported by the National Natural Science Foundation of China (Grant No. 51905002), Anhui Provincial Natural Science Foundation (Grant No. 2008085QE230), Open project of Key Laboratory of Green Fabrication and Surface Technology of Advanced Metal Materials (Grant No. GFST2021KF06), Open Project of AnHui Province Key Laboratory of Special and Heavy Load Robot (Grant Nos. TZJQR003-2021, TZJQR003-2020).

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Authors and Affiliations

  1. Anhui Province Key Laboratory of Special Heavy Load Robot, Anhui University of Technology, Ma’anshan, 243032, China

    Li Lv, Tao Wang, Jia-Hao Wang, Sheng-Quan Wang, Li-Ping Shi & Meng Li

  2. School of Mechanical Engineering, Anhui University of Technology, Ma’anshan, 243032, China

    Li Lv, Tao Wang, Jia-Hao Wang, Sheng-Quan Wang, Li-Ping Shi, Meng Li & De-Yu Tu

  3. Key Laboratory of Green Fabrication and Surface Technology of Advanced Metal Materials, Ministry of Education, Anhui University of Technology, Ma’anshan, 243032, China

    Tao Wang & Meng Li

  4. School of Electrical and Information Engineering, Anhui University of Technology, Ma’anshan, 243032, China

    Si-Le Chen

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  1. Li Lv
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  2. Tao Wang
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  3. Jia-Hao Wang
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Correspondence to Tao Wang.

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Lv, L., Wang, T., Wang, JH. et al. Numerical Simulation and Experimental Investigation on Etching Process of Atmospheric Pressure Cold Plasma Jet with Shielding Gas. Plasma Chem Plasma Process 42, 321–337 (2022). https://doi.org/10.1007/s11090-021-10226-y

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  • DOI: https://doi.org/10.1007/s11090-021-10226-y

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