Abstract
Spin-filter van der Waals Magnetic tunnel junctions (sf-vdW MTJs) formed by an interlayer antiferromagnetic (AFM) vdW semiconductor as a barrier have exhibited promising prospects in achieving a high tunneling magnetoresistance (TMR) ratio in MTJs. Here, using first-principles calculations, we investigate the spin-dependent transport and the TMR effect of sf-vdW MTJs formed by sandwiching bilayer and trilayer barriers between two graphite electrodes ( sf-vdW MTJs). Similar to the experimental results of sf-vdW MTJs formed by a few-layer barrier, the TMR ratios of the sf-vdW MTJs increase first with the increase of bias voltage and decrease with the further increase of bias voltage after reaching the highest points because the conduction bands of the interlayer ferromagnetic (FM) barrier at the points go into the bias window earlier than those of the interlayer AFM barrier with the increase of bias voltage. Compared to the TMR ratios of about 170% and 206% at zero bias voltage, the TMR ratios of the sf-vdW MTJs with bilayer and trilayer barriers are largely increased about 34 and 67 times by the optimized bias voltage, respectively. Correspondingly, a giant TMR ratio of about 6000% and 14 000% can be achieved in the sf-vdW MTJs with bilayer and trilayer barriers at 0.14 and 0.125 V bias voltage, respectively. Our results elucidate the mechanism of bias voltage induced giant TMR ratio in the sf-vdW MTJs and provide promising routes for developing MTJs with a high TMR ratio.
- Received 13 May 2021
- Revised 11 September 2021
- Accepted 11 October 2021
DOI:https://doi.org/10.1103/PhysRevB.104.144423
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