Elsevier

Ultramicroscopy

Volume 230, November 2021, 113386
Ultramicroscopy

Brightness evaluation of pulsed electron gun using negative electron affinity photocathode developed for time-resolved measurement using scanning electron microscope

https://doi.org/10.1016/j.ultramic.2021.113386Get rights and content

Highlights

Abstract

Temporal changes in carrier relaxations, magnetic switching, and biological structures are known to be in the order of ns. These phenomena can be typically measured by means of an optical-pump & electron-probe method using an electron microscope combined with a pulsed electron source. A photoemission-type pulsed electron gun makes it possible to obtain a short-pulsed electron beam required for high temporal resolution. On the other hand, spatial resolution is restricted by the brightness of the pulsed electron gun used in electron microscopes when a low brightness electron source is used and an irradiation current larger than a certain value is required. Thus, we constructed a prototype pulsed electron gun using a negative electron affinity (NEA) photocathode for time-resolved measurement using a scanning electron microscope (SEM) with high spatiotemporal resolution. In this study, a high-speed detector containing an avalanche photodiode (APD) was used to directly measure waveforms of the pulsed electron beam excited by a rectangular-shape pulsed light with a variable pulse duration in the range of several ns to several μs. The measured waveforms were the same rectangular shape as incident pulsed excitation light. The maximum peak brightness of the pulsed electron beam was 4.2×107 A/m2/sr/V with a pulse duration of 3 ns. This value was larger than that of the continuous electron beam (1.6 × 107 A/m2/sr/V). Furthermore, an SEM image with image sharpness of 6.2 nm was obtained using an SEM equipped with a prototype pulsed electron gun at an acceleration voltage of 3 kV.

Introduction

The scanning electron microscope (SEM) is an essential tool widely used for observing and analyzing various specimens at a high spatial resolution in many fields including semiconductor devices, materials sciences, and biology [1]. Recently, improvements to pulsed electron sources have made it possible to obtain short-pulsed electron beams with a pulse duration shorter than 1 ns [2]. By using electron microscopes combined with short-pulsed electron sources, measurements with high spatiotemporal resolution can be realized [4]. Such a measurement technique makes it possible to visualize local and fast phenomena such as temporal changes in carrier relaxations, magnetic switching, and biological structures [[3], [5], [6], [20]]. A photoemission-type electron gun is preferable for obtaining high temporal resolutionbecause an electron beam with a short pulse duration can be easily generated by exciting with a pulsed light [9].

In general, the spatial resolution of a microscope depends on diffraction and aberrations. However, for SEM, it is necessary to account for the limitation in spatial resolution due to the brightness of the electron gun. The brightness of an electron gun is defined as an irradiation probe current per unit area and unit solid angle. The brightness normalized for acceleration voltage (V0) of the electron beam at a source is defined as a reduced brightness (βV), which is represented asβV=Ip/(π2ro2αo2V0),where Ip is the probe current and ro and αo are the beam radius and beam aperture angle at a virtual source, respectively [1]. The reduced brightness is normalized by the acceleration voltage, so it does not depend on the energy of the electron beam. If an electron beam emitted from the virtual source is focused on the specimen using an electron optics system with a magnification of M, the projected source size and the beam aperture angle at the specimen are calculated by rs=Mr0, and αs=α0/M, respectively. Given Eq. (1), a source size projected onto the specimen is represented as,2rs=2/(παs)(lp/βvV0))This indicates that the spatial resolution is limited by brightness when using a low brightness electron source and more than a certain value of the probe current. Eq. (2) can be used to estimate the required brightness for the electron gun. When aiming for a spatial resolution of 10 nm, a source size (2rs) projected onto the specimen should be smaller than 10 nm. The optimal irradiation angle (αs) at the specimen under the condition for high spatial resolution with an acceleration voltage about 1 kV is several mrad, which is determined by diffraction, aberrations, and brightness. Because the irradiated probe current (Ip) should be larger than 10 pA to obtain SEM images with sufficient signal-to-noise ratio, brightness (βv) must be higher than 1×107 A/m2/sr/V. In addition, high brightness is expected to be advantageous for high-throughput measurement.

In this study, we focus on an electron gun using a high-brightness negative electron affinity (NEA) photocathode with p-type GaAs and Cs-O adsorbates. The NEA condition is defined as when the bottom of the conduction band inside GaAs is higher than vacuum level and the electrons excited from the valence band to the conduction band by light are spontaneously emitted to vacuum. The advantages of electron sources using the NEA photocathode are high brightness (1.3 × 107 A/m2/sr/V) [12] and small energy spread (0.24 eV) [13]. By utilizing an electron gun with the NEA photocathode, the spatial resolution of an SEM in the low acceleration voltage can be improved by reducing chromatic aberration which is proportional to energy spread [10].

The purpose of this study is to evaluate pulsed electron beams emitted from a prototype electron gun using the NEA photocathode excited with a pulse duration of several ns. To evaluate the both time-average brightness and peak brightness of the pulsed electron beam, waveforms of the pulsed electron beams were measured by means of a high-speed detector which consists of a silicon avalanche photodiode (Si-APD) and a high-speed amplifier.

Section snippets

Methods

In this study, a time-average value (A¯) and a pulse peak value (A^) for a pulsed physical quantityA are distinguished, as shown in Fig. 1. The physical quantity A corresponds to excitation optical intensity (P), emission current (IE), probe current (IP), reduced brightness (βV), etc.

The schematic of a measurement system for evaluating the waveforms and brightness of the pulsed electron beam is shown in Fig. 2. A prototype electron gun was mounted on an FE-SEM SU5000 (Hitachi High-Tech Corp.).

Pulse waveforms

The measured waveforms of a pulsed electron beam with pulse duration between 3 ns and 100 ns are shown in Fig. 6. The measurements verified that the waveforms were approximately rectangular under each pulse condition. Overshoots at the rising edges, undershoots at the falling edges, and signal ringing were derived from the measurement circuit of the prototype detector. Multiplication noise of the Si-APD is superimposed on the pulse signal . Since we verified that the pulse waveforms of the

Conclusion

In this study, the irradiation performance of a pulsed electron gun using the NEA photocathode was evaluated with a pulse duration of several ns. The resulting waveform measurements indicated that the prototype pulsed electron gun was capable of generating a high-quality pulse waveform. The maximum peak brightness of the prototype pulsed electron gun observed in this study was 4.2 × 107 A/m2/sr/V with a pulse duration of 3 ns and a pulse frequency of 1 MHz at an acceleration voltage of 3 kV.

Declaration of Competing Interest

The authors declare that they have no known competing financial interests or personal relationships that could have appeared to influence the work reported in this paper.

Acknowledgements

We thank H. Nishihara and T. Ide of the Research & Development Group at Hitachi, Ltd. for supporting our experiments.

References (17)

  • T. Ohshima

    NEA photocathode for SEM application

    Microelectron. Eng.

    (2003)
  • D.C. Bell et al.

    Low Voltage Electron Microscopy: Principles and Applications

    (2013)
  • L. Zhang

    Photoemission sources and beam blankers for ultrafast electron microscopy

    Struct. Dyn.

    (2019)
  • A.H. Zewail

    Four-Dimensional Electron Microscopy

    Science

    (2010)
  • A.H. Zewail et al.

    4D Electron Microscopy: Imaging in Space and Time

    (2009)
  • F. Carbone

    Dynamics of Chemical Bonding Mapped by Energy-Resolved 4D Electron Microscopy

    Science

    (2009)
  • B. Barwick

    4D Imaging of Transient Structures and Morphologies in Ultrafast Electron Microscopy

    Science

    (2008)
  • M. Kuwahara

    The Boersch effect in a picosecond pulsed electron beam emitted from a semiconductor photocathode

    Appl. Phys. Lett.

    (2016)
There are more references available in the full text version of this article.

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