Studying the surface morphology, linear and nonlinear optical properties of manganese (III) phthalocyanine chloride/FTO films
Introduction
In many recent works, Phthalocyanine (Pc) compounds have attracted significant interest in several scientific fields such as medicine [1], optical communication [2], chemical sensors [3], and solar cells [4]. These compounds have high radiation resistance, significant and easily adapted linear/nonlinear optical properties possess many scientific applications, including materials science, optoelectronic, and photonic device fabrication [5]. Furthermore, they display high chemical and thermal stability, increasing the possibility of using this compound as optical sensors, increasing surface acoustic waves, catalysts, biological imaging, and therapy.
However, due to their low solubility and the formation of aggregates in solution and solid films, several researchers study the modification of adding different metals to Pc's central [6]. It is well known that metal phthalocyanine (MPc) compounds exhibit excellent nonlinear optical (NLO) properties due to the remarkably symmetrical spatial configuration and overall π-electronic conjugation structure. In literature, several metals such as Zinc, Lead, Copper, Gallium, etc., are integrating into Pc's side group to study the change of optical and electrochemical properties [7,8]. Various studies have proven that Pc's optical properties and applications are affected by the central metal's nature [9]. Farag et al. [10] studied the effect of central metals (Cu (II), Zn (II), Co (II), Pb (II), and Mn (III)) in the metal-free Pc compound. They showed that the surface morphology depends on the kind of metal complex. Several optical parameters were analyzed and showed that the nanocrystalline MPc thin films could be favorable for optoelectronic applications.
On the other hand, researchers have been interested in the phthalocyanine compounds with metal chloride because they exhibit distinctive optical properties [[11], [12], [13]] and photoelectric behavior worthy of attention [14,15]. The optical properties of AlPcCl [11] and GaPcCl [12,13] films have been studied. These films displayed indirect permissible interband transitions, and different dispersion and absorption parameters were evaluated. Besides, electrochemical, dielectric, electrical, and measurements of AlPcCl have been performed, where cyclic voltammetry was utilized to calculate the energy gap and was found to be 1.42 eV [16]. Rajesh and Menon investigated the electrical conductivity of MnPcCl films [17]. They came to the conclusion that oxygen has a significant influence on electrical parameters. There is a scarcity of scientific research on the properties of MnPcCl films, particularly their optical properties, which are greatly important for photovoltaic applications.
In General, any electronic or photoelectric applications require a transparent electrode and usually used Fluorine Doped Tin Oxide (FTO) coated glass substrate. FTO has a higher conductivity, good optical transmittance, and reflection in the infrared range [18]. For these excellent properties, FTO would be suitable for deposited MnPcCl films. Thus, the present study aims to deposit MnPcCl films on FTO by the conventional thermal deposition technique. The thickness influence of MnPcCl film on optical properties will be analyzed. MnPcCl films' significant parameters such as refractive index, high-frequency dielectric constants, real and imaginary parts of dielectric constants, absorption index, and lattice dielectric constants were measured and interpreted. Finally, the optical limiting of MnPcCl film was studied via two laser wavelength sources (532 nm and 638 nm) for laser filters.
Section snippets
Preparation of MnPcCl films on FTO substrate
All of the materials used in this work were obtained from Sigma-Aldrich. Using a high HHV Auto 306 coating unit, a thermal vacuum evaporating technique was used to deposit MnPcCl film on highly cleaned FTO layer/glass substrates. The gases were successfully evacuated until the desired pressure of 2.5 × 10−4 Pa was reached. Homogeneous MnPcCl films were obtained by the installed FTO-substrates in a rotatable holder, separated from the evaporator by 25 cm and at room temperature. To control the
Surface morphological and structural of MnPcCl films on FTO
Fig. 1 shows a-2D AFM images for MnPcCl film's morphology on FTO prepared at different thicknesses. The observed AFM images show that the surface morphology of MnPcCl film on FTO was homogeneous and formed by spherical and elliptical nanoparticles in shapes. The XEI software was utilized to analyze the AFM data, and then the average grain size and roughness were determined. The average grain size of MnPcCl on FTO films was found to be increased from 118, 136, 145, and 181 nm as film thicknesses
Conclusion
MnPcCl thin films with various thicknesses (55, 72, 110, and 125 nm) were prepared using the traditional thermal evaporation technique. The impact of the film thickness on the structural and optical properties of thin films was determined by using AFM, XRD, and optical spectrometer. Moreover, the MnPcCl film shows a strong UV–vis absorption in the range of 650–850 nm. Meanwhile, the MnPcCl film has two energy band gaps, and it was also noted that there was a slight change in the band gap energy
Credit author statement
A.A.A. Darwish: Idea – thin film preparation – reviewing. Saloua Helali: Investigation-writing, I.S. Yahia: Idea – methodology - reviewing. E.F.M. El-Zaidia: Idea – data analysis, Editing.
Declaration of competing interest
The authors declare that they have no conflict of interest.
Acknowledgment
The authors express their appreciation to “The Research Center for Advanced Materials Science (RCAMS)" at King Khalid University to fund this work under the grant number RCAMS/KKU/016-20.
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