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Molecular Layer Deposition and Pyrolysis of Polyamide Films on Si(111) with Formation of β-SiC

  • PHYSICAL CHEMISTRY OF SURFACE PHENOMENA
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Abstract

Molecular layer deposition (MLD) of thin polyamide films was performed using 1,3,5-benzenetricarbonyltrichloride (trimesoyl chloride, TMC) and 1,2-ethylenediamine (EDA) as precursors at a temperature of 120°С. The growth rate at this temperature was 1.85 nm/cycle. In situ quartz crystal microbalance (QCM) study was used to determine the film growth behavior. QCM signal showed linear film growth with an increasing number of MLD cycles. Pyrolysis of MLD polyamide films on Si(111) was conducted at temperatures of 1100 and 1300°С and a pressure of 10−7 Torr. Thin heteroepitaxial films of β-SiC (3C–SiC) on the Si(111) were obtained as a result of a solid-phase reaction between Si and C at 1300°С. A variety of high-resolution spectroscopic techniques were used to determine the elemental composition and crystal structure of organic and ceramic films.

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ACKNOWLEDGMENTS

The authors thank A.M. Ismailov (Faculty of Physical Electronics, Dagestan State University) for his technical assistance and help in obtaining RHEED patterns.

Funding

This work was supported by the Russian Foundation for Basic Research, project no. 19-33-90045 (R.R. Amashaev); and partially by the Government of the Russian Federation, grant no. FZNZ-2020-0002 (I.M. Abdulagatov).

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  1. Dagestan State University, 367000, Makhachkala, Russia

    R. R. Amashaev, I. M. Abdulagatov, M. Kh. Rabadanov & A. I. Abdulagatov

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  1. R. R. Amashaev
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  2. I. M. Abdulagatov
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  3. M. Kh. Rabadanov
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Correspondence to I. M. Abdulagatov.

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Translated by Z. Smirnova

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Amashaev, R.R., Abdulagatov, I.M., Rabadanov, M.K. et al. Molecular Layer Deposition and Pyrolysis of Polyamide Films on Si(111) with Formation of β-SiC. Russ. J. Phys. Chem. 95, 1439–1448 (2021). https://doi.org/10.1134/S0036024421070049

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