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Numerical simulation and microchannels parameters optimization for thermal management of GaN HEMT devices

Jiahao Wang (MOE Key Laboratory of Enhanced Heat Transfer and Energy Conservation, Beijing Key Laboratory of Heat Transfer and Energy Conversion, Beijing University of Technology, Beijing, China)
Guodong Xia (MOE Key Laboratory of Enhanced Heat Transfer and Energy Conservation, Beijing Key Laboratory of Heat Transfer and Energy Conversion, Beijing University of Technology, Beijing, China)
Ran Li (MOE Key Laboratory of Enhanced Heat Transfer and Energy Conservation, Beijing Key Laboratory of Heat Transfer and Energy Conversion, Beijing University of Technology, Beijing, China)
Dandan Ma (MOE Key Laboratory of Enhanced Heat Transfer and Energy Conservation, Beijing Key Laboratory of Heat Transfer and Energy Conversion, Beijing University of Technology, Beijing, China)
Wenbin Zhou (MOE Key Laboratory of Enhanced Heat Transfer and Energy Conservation, Beijing Key Laboratory of Heat Transfer and Energy Conversion, Beijing University of Technology, Beijing, China)
Jun Wang (MOE Key Laboratory of Enhanced Heat Transfer and Energy Conservation, Beijing Key Laboratory of Heat Transfer and Energy Conversion, Beijing University of Technology, Beijing, China)

International Journal of Numerical Methods for Heat & Fluid Flow

ISSN: 0961-5539

Article publication date: 22 June 2021

Issue publication date: 26 August 2021

320

Abstract

Purpose

This study aims to satisfy the thermal management of gallium nitride (GaN) high-electron mobility transistor (HEMT) devices, microchannel-cooling is designed and optimized in this work.

Design/methodology/approach

A numerical simulation is performed to analyze the thermal and flow characteristics of microchannels in combination with computational fluid dynamics (CFD) and multi-objective evolutionary algorithm (MOEA) is used to optimize the microchannels parameters. The design variables include width and number of microchannels, and the optimization objectives are to minimize total thermal resistance and pressure drop under constant volumetric flow rate.

Findings

In optimization process, a decrease in pressure drop contributes to increase of thermal resistance leading to high junction temperature and vice versa. And the Pareto-optimal front, which is a trade-off curve between optimization objectives, is obtained by MOEA method. Finally, K-means clustering algorithm is carried out on Pareto-optimal front, and three representative points are proposed to verify the accuracy of the model.

Originality/value

Each design variable on the effect of two objectives and distribution of temperature is researched. The relationship between minimum thermal resistance and pressure drop is provided which can give some fundamental direction for microchannels design in GaN HEMT devices cooling.

Keywords

Acknowledgements

This work was supported by National Natural Science Foundation of China (No. 51976002).

Declaration of interest statement: The authors declare that they have no known competing financial interests or personal relationships that could have appeared to influence the work reported in this article.

Citation

Wang, J., Xia, G., Li, R., Ma, D., Zhou, W. and Wang, J. (2021), "Numerical simulation and microchannels parameters optimization for thermal management of GaN HEMT devices", International Journal of Numerical Methods for Heat & Fluid Flow, Vol. 31 No. 9, pp. 2841-2861. https://doi.org/10.1108/HFF-07-2020-0393

Publisher

:

Emerald Publishing Limited

Copyright © 2020, Emerald Publishing Limited

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