Issue 4, 2021

Composition and properties of RF-sputter deposited titanium dioxide thin films

Abstract

The photocatalytic properties of titania (TiO2) have prompted research utilising its useful ability to convert solar energy into electron–hole pairs to drive novel chemistry. The aim of the present work is to examine the properties required for a synthetic method capable of producing thin TiO2 films, with well defined, easily modifiable characteristics. Presented here is a method of synthesis of TiO2 nanoparticulate thin films generated using RF plasma capable of homogenous depositions with known elemental composition and modifiable properties at a far lower cost than single-crystal TiO2. Multiple depositions regimes were examined for their effect on overall chemical composition and to minimise the unwanted contaminant, carbon, from the final film. The resulting TiO2 films can be easily modified through heating to further induce defects and change the electronic structure, crystallinity, surface morphology and roughness of the deposited thin film.

Graphical abstract: Composition and properties of RF-sputter deposited titanium dioxide thin films

Supplementary files

Article information

Article type
Paper
Submitted
14 Oct 2020
Accepted
07 Dec 2020
First published
08 Dec 2020
This article is Open Access
Creative Commons BY-NC license

Nanoscale Adv., 2021,3, 1077-1086

Composition and properties of RF-sputter deposited titanium dioxide thin films

J. Daughtry, A. S. Alotabi, L. Howard-Fabretto and G. G. Andersson, Nanoscale Adv., 2021, 3, 1077 DOI: 10.1039/D0NA00861C

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