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Exploring Optimization Merit Function-Based Plasmonic Resonance at NIR Using ITO

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Abstract

In this paper, indium tin oxide (ITO) is considered as an alternative plasmonic material beyond conventional plasmon generating metal. A total of 150-nm-thick ITO film-based Kretschmann configuration is demonstrated in NIR region. Minimum possible reflectance with optimum FWHM of resonance plot is the essential criteria for the incident angle selection of the said structure to increase the sensitivity and improve the performance of SPR biosensors in wavelength interrogation mode. Reflectance, phase, and field enhancement curves have been studied for different gaseous samples, and corresponding wavelength sensitivity has been calculated for the change of refractive index of the sample in the order of two. Differential resonance parameters have also been studied which are found to provide increased sensitivity. Theoretical simulation-based results validate that the proposed sensor can provide higher sensitivity by measuring the differential phase.

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Funding

The author J. Banerjee received financial support from the Department of Science and Technology, India (Ref.No.SR/WOS-A/PM-1015/2015), under Women Scientist Scheme.

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J. Banerjee designed the model, performed the numerical simulations, analyzed the data, and wrote the manuscript. S. Rajak helped in literature survey and overall guidance by M. Ray.

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Correspondence to Jayeta Banerjee.

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Banerjee, J., Rajak, S. & Ray, M. Exploring Optimization Merit Function-Based Plasmonic Resonance at NIR Using ITO. Plasmonics 16, 939–945 (2021). https://doi.org/10.1007/s11468-020-01361-x

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  • DOI: https://doi.org/10.1007/s11468-020-01361-x

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