Abstract
This work presents the result of modeling a miniature forming lens for a high-voltage electron-beam lithography system. The diameter of the outer yoke is only 64 mm. This allows the installation of four electron optical systems over a six-inch photomask. For a 50-kV electron beam and 15 mm flange focal distance, the characteristics of the obtained miniature lens provide the absence of yoke saturation and a 25-nm resolution for a 100 × 100 um scanning field. A study of the dependences of the miniature lens’ electron-optical properties on the channel diameter, gap width and yoke length is performed. The obtained results enable selection of the optimal configuration of the forming lens for the development of an electron-beam-lithography system. A four-column composition will allow an increase in the efficiency of the lithography process by up to four times.
Similar content being viewed by others
REFERENCES
E. D. Liu, C. Tran, T. Prescop, and D. K. Lam, Proc. SPIE 8323, 1 (2012). https://doi.org/10.1117/12.916118
H. Hayakawa, M. Takizawa, M. Kurokawa, A. Tsuda, M. Takigawa, S. Hamaguchi, A. Yamada, K. Sakamoto, and T. Nakamura, Proc. SPIE 8701, 03–1 (2013). https://doi.org/10.1117/12.2029193
M. Kurokawa, T. Sato, S. Kojima, and A. Yamada, US Patent 0323760A1, 9 November 2017.
A. Yamada, H. Tanaka, T. Abe, and Y. Shimizu, Proc. SPIE 8680, 25–1 (2013). https://doi.org/10.1117/12.2011376
E. Slot, M. Wieland, G. de Boer, P. Kruit, G. Berge, A. Houkes, R. Jager, T. van de Peut, J. Peijster, S. Steenbrink, T. Teepen, A. van Veen, and B. Kampherbeek, Proc. SPIE 6921, 1 (2008). https://doi.org/10.1117/12.771965
E. Platzgummer, C. Klein, and H. Loeschner, J. Micro/Nanolithogr., MEMS, MOEMS 12 (3), 031108–1 (2013).
E. Platzgummer, C. Klein, and H. Loeschner, Proc. SPIE 8166, 22–1 (2011). https://doi.org/10.1117/12.895523
I. Servin, N. A. Thiam, P. Pimenta-Barros, M. Pourteau, A. Mebiene, J. Jussot, J. Pradelles, P. Essomba, L. Lattard, P. Brandt, and M. Wieland, Proc. SPIE 9423, 1 (2015). https://doi.org/10.1117/12.2085915
T. Kemen, T. Garbowski, and D. Zeidler, Proc. of SPIE 9658, 07–1 (2015). https://doi.org/10.1117/12.2195705
M. Szilagyi, Electron and Ion Optics (Plenum, New York, 1988; Mir, Moscow, 1990).
B. Lencova and J. Zlamal, Nucl. Instrum. Methods Phys. Res., Sect. A 645 (1), 278 (2011). https://doi.org/10.1016/j.nima.2010.12.198
B. Lencova, Nucl. Instrum. Methods Phys. Res., Sect. A 427, 329 (1999). https://doi.org/10.1016/S0168-9002(98)01551-4
V. V. Kazmiruk and T. N. Savitskaya, Bull. Russ. Acad. Sci.: Phys. 75, 1194 (2011).
V. V. Kazmiruk, I. G. Kurganov, and T. N. Savitskaya, Bull. Russ. Acad. Sci.: Phys. 78, 821 (2014).
V. V. Kazmiruk, I. G. Kurganov, and T. N. Savitskaya, J. Surf. Invest.: X-ray, Synchrotron Neutron Tech. 13, 594 (2019). https://doi.org/10.1134/S1027451019040074
Funding
The work was funded under State Assignment no. 075-00920-20-00.
Author information
Authors and Affiliations
Corresponding authors
Rights and permissions
About this article
Cite this article
Kazmiruk, V.V., Kurganov, I.G. & Savitskaya, T.N. Miniature Forming Lens for a High-Voltage Electron-Beam Lithography System. J. Surf. Investig. 14, 1366–1370 (2020). https://doi.org/10.1134/S1027451020060336
Received:
Revised:
Accepted:
Published:
Issue Date:
DOI: https://doi.org/10.1134/S1027451020060336