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Structure and Properties of the Al–B–Si–C Coatings Deposited by Magnetron Sputtering

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Abstract

The structural, mechanical, and electrophysical properties of Al–B, Al–B–C, and Al–B–Si–C coatings obtained by dual magnetron sputtering of AlB2, SiC, and graphite targets are studied. During deposition, the current applied to the AlB2-containing target (IAlB) is used as a main variable parameter. Deposited coatings are characterized by X-ray diffraction, infrared spectroscopy (FTIR), X-ray photoelectron spectroscopy (XPS), Knoop microhardness tests, and current–voltage characteristic measurements. It is established that all the deposited coatings are X-ray amorphous materials. The FTIR and XPS results show that the B–B, Al–B, B–O, and Al–O bonds are main bonds in all the deposited coatings. Dual sputtering of targets with AlB2 and C, and AlB2 and SiC gives rise to the formation of additional B–C, Si–C, and C–C main bonds in the deposited coatings. It is found the coatings are strengthened with an increase in the IAlB current as a result of increasing the number of B–B and Al–B bonds. The current–voltage characteristics of Al–B and Al–B–C coatings indicate that the coatings are disordered semiconductors in which the hopping conduction mechanism operates.

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Authors and Affiliations

  1. Frantsevich Institute of Materials Science Problems, National Academy of Sciences of Ukraine, 03142, Kyiv, Ukraine

    A. O. Kozak, V. I. Ivashchenko, P. L. Scrynskyy, V. B. Muratov, O. K. Sinelnichenko & O. I. Olifan

  2. Lashkaryov Institute of Semiconductor Physics, National Academy of Sciences of Ukraine, 02000, Kyiv, Ukraine

    V. V. Tetyorkin & A. V. Sukach

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  1. A. O. Kozak
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  2. V. I. Ivashchenko
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  4. V. B. Muratov
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Correspondence to A. O. Kozak or V. I. Ivashchenko.

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Translated by O. Kadkin

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Kozak, A.O., Ivashchenko, V.I., Scrynskyy, P.L. et al. Structure and Properties of the Al–B–Si–C Coatings Deposited by Magnetron Sputtering. J. Superhard Mater. 42, 311–322 (2020). https://doi.org/10.3103/S1063457620050184

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