• Editors' Suggestion

Bi2Se3 thin films heteroepitaxially grown on αRuCl3

Joon Young Park, Janghyun Jo, Jennifer A. Sears, Young-June Kim, Miyoung Kim, Philip Kim, and Gyu-Chul Yi
Phys. Rev. Materials 4, 113404 – Published 24 November 2020

Abstract

Combining various two-dimensional materials into van der Waals (vdW) heterostructures has been shown to lead to emergent quantum systems. A heterostructure composed of a vdW topological insulator (TI) such as Bi2Se3 with a quantum spin liquid (QSL) such as αRuCl3 is of great interest for the potential for the chiral Dirac electrons in the TI surface states to interact strongly with the fractionalized fermionic spin excitations in the QSL. We report the heteroepitaxial growth of Bi2Se3 thin films on αRuCl3 as well as the characterization of their structural and electrical properties. Bi2Se3 thin films with an atomically smooth and uniform surface are grown by molecular beam epitaxy. The heterostructure exhibits a preferential epitaxial relationship corresponding to (5×5)Bi2Se3/(23×23) R30αRuCl3 commensurate supercells with a periodicity of 1.2 nm. The formation of the superlattice despite a lattice mismatch as large as 60% is attributed to the vdW heteroepitaxy. Magnetotransport measurements as a function of temperature show Bi2Se3 films grown on αRuCl3 are heavily n-doped, ne1014cm2, with mobility μ 450cm2V1s1 at low temperatures.

  • Figure
  • Figure
  • Figure
  • Figure
  • Received 26 June 2020
  • Revised 4 October 2020
  • Accepted 29 October 2020

DOI:https://doi.org/10.1103/PhysRevMaterials.4.113404

©2020 American Physical Society

Physics Subject Headings (PhySH)

Condensed Matter, Materials & Applied Physics

Authors & Affiliations

Joon Young Park1,2, Janghyun Jo3,*, Jennifer A. Sears4,†, Young-June Kim4, Miyoung Kim3, Philip Kim2,‡, and Gyu-Chul Yi1,§

  • 1Department of Physics and Astronomy, Institute of Applied Physics, and Research Institute of Advanced Materials, Seoul National University, Seoul 08826, Republic of Korea
  • 2Department of Physics, Harvard University, Cambridge, Massachusetts 01238, USA
  • 3Department of Materials Science and Engineering and Research Institute of Advanced Materials, Seoul National University, Seoul 08826, Republic of Korea
  • 4Department of Physics, University of Toronto, Toronto, Ontario M5S 1A7, Canada

  • *Present address: Ernst Ruska-Centre for Microscopy and Spectroscopy with Electrons and Peter Grünberg Institute, Forschungszentrum Jülich, 52425 Jülich, Germany.
  • Present address: Deutsches Elektronen-Synchrotron DESY, 22607 Hamburg, Germany.
  • Corresponding author: pkim@physics.harvard.edu
  • §Corresponding author: gcyi@snu.ac.kr

Article Text (Subscription Required)

Click to Expand

References (Subscription Required)

Click to Expand
Issue

Vol. 4, Iss. 11 — November 2020

Reuse & Permissions
Access Options
Author publication services for translation and copyediting assistance advertisement

Authorization Required


×
×

Images

×

Sign up to receive regular email alerts from Physical Review Materials

Log In

Cancel
×

Search


Article Lookup

Paste a citation or DOI

Enter a citation
×