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Corrosion in Solutions of Mineral Acids of Ti–B–N Thin Films Obtained by Reactive Magnetron Sputtering

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Abstract

The interaction of thin Ti–B–N films obtained by magnetron reactive sputtering of a TiB2 target was studied in an atmosphere of a gas argon–nitrogen mixture (85 vol % Ar + 15 vol % N2), with mineral acids (HCl, H2SO4, H3PO4, HNO3). It was found that the hexagonal boron nitride formed during the deposition process, along with titanium nitride, forms a resistant protective film that protects the bulk (~85%) of the film from corrosion.

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Funding

This work was carried out on within the framework of state order no. 0089-2019-0007, state registration no. AAAA-A19-119061890019-5 of June 18, 2019, using the equipment of the Analytical Center for Collective Use of the Institute of Problems of Chemical Physics, Russian Academy of Sciences.

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Authors and Affiliations

  1. Institute of Problems of Chemical Physics, Russian Academy of Sciences, 142432, Chernogolovka, Moscow oblast, Russia

    I. I. Korobov, G.V. Kalinnikov, A. V. Ivanov, N. N. Dremova, A. A. Belmesov & S. P. Shilkin

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  1. I. I. Korobov
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  2. G.V. Kalinnikov
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  3. A. V. Ivanov
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  4. N. N. Dremova
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  5. A. A. Belmesov
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  6. S. P. Shilkin
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Correspondence to G.V. Kalinnikov.

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Korobov, I.I., Kalinnikov, G., Ivanov, A.V. et al. Corrosion in Solutions of Mineral Acids of Ti–B–N Thin Films Obtained by Reactive Magnetron Sputtering. Prot Met Phys Chem Surf 56, 1023–1026 (2020). https://doi.org/10.1134/S2070205120040164

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  • DOI: https://doi.org/10.1134/S2070205120040164

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