Elsevier

Optical Materials

Volume 111, January 2021, 110617
Optical Materials

Introducing and studying origin of deep electron traps in Ba1-xZrSi3O9:xEu for optical data storage

https://doi.org/10.1016/j.optmat.2020.110617Get rights and content

Highlights

  • The doping of Eu ions introduces deep electron traps.

  • The trap distribution is tunable by atmosphere treatment.

  • The deep traps should originate from VO1 oxygen vacancy.

  • Ba1-xZrSi3O9:xEu materials are good candidates for optical data storage.

Abstract

Eu ions doped Ba1-xZrSi3O9:xEu materials are synthesized by solid state reaction method, facing optical data storage applications. The doping of Eu ions introduces deep electron traps at 0.90 eV below the conduction band minimum of Ba1-xZrSi3O9:xEu (1400 °C air). Moreover, the trap distribution is tunable, and there are only deep traps in sample Ba0·85ZrSi3O9:0.15Eu (1400 °C Ar/H2) with the disappearance of shallow traps. Deep traps can prevent information from loss, while the disappearance of shallow traps can eliminate interference to deep traps by avoiding redeployment of electrons between shallow and deep traps over time. Further, post-sintering in a reducing atmosphere after sintering in the air can increase the concentration of deep traps and deepen the color of samples, while post-sintering in the air after sintering in a reducing atmosphere can obviously decrease the concentration of deep traps and the color of samples return to white from yellow. Experimental results indicate that the deep traps in samples Ba1-xZrSi3O9:xEu should originate from oxygen vacancy defects, which also serve as color centers. First principles calculations show that VO1 oxygen vacancy defects introduce obvious defect energy levels below the conduction band minimum of BaZrSi3O9-VO1, which further illustrate the deep traps should originate from VO1 oxygen vacancy defects located at the connection of layer to layer in layered matrix. Ba1-xZrSi3O9:xEu materials with deep electron traps are good candidates for optical data storage.

Introduction

With the rapid development of cloud computing, big data, artificial intelligence and so on, data storage technologies are facing great challenges. Optical data storage technologies have the advantage of low cost, long service lifetime, large capacity, low energy consumption, safety and reliability [[1], [2], [3]]. Blue ray disk is the current mainstream conventional optical data storage technology; however, data storage density is often theoretically restrained due to the diffraction limit of optical system. Traditional optical data storage industry has been overwhelmed, so it is very important to expand new optical data storage technology and develop new optical data storage materials.

Deep electron traps below the conduction band minimum can store electrons after excitation with short wavelength light and can release stored electrons by means of high temperature thermal stimulation or long wavelength light stimulation, that is, they can realize data write-in and read-out, so they have potential applications in optical data storage technology. This kind of optical data storage technology does not solve the problem about diffraction limit of optical system, but by expanding wavelength, intensity or volume of electron trapping materials into multiplexing optical data storage technology, the size of data will be significantly improved by orders of magnitude. The research of electron trapping optical data storage materials has attracted wide attention [[1], [2], [3], [4], [5], [6]]. Lin et al. developed a brand new optical storage medium of transparent glass ceramic embedded with photo stimulated LiGa5O8:Mn2+ nanocrystals capable of achieving bit-by-bit optical data write-in and read-out in a photon trapping/de-trapping mode [1]. Lin et al. also developed a BaSi2O5:Eu2+, Nd3+ material containing deep electron traps in a narrow distribution, which has potential as efficient optical data storage medium [3]. Many electron trapping optical data storage materials have been developed, however, the lack of materials with excellent optical data storage performance is still the bottleneck that restrains their practical applications.

The narrow deep electron traps are suitable for electron trapping optical data storage materials [2,3]. In this work, we mainly focus on the study of deep electron traps in Ba1-xZrSi3O9:xEu for optical data storage applications. So far, almost all the reported references about Ba1-xZrSi3O9:xEu materials have focused on studying the photoluminescence (PL) or persistent luminescence properties [[7], [8], [9], [10], [11], [12], [13], [14], [15]], but neglecting their possible applications in optical data storage. For example, we have previously reported that Ba1-xZrSi3O9:xEu (x = 0.15) can directly emit nearly white light under the excitation of multi-wavelength ultraviolet radiation, due to the coexistence of multiple luminescent centers and the energy transfer among them [7]. Guo et al. reported that the long-lasting phosphorescence of BaZrSi3O9:Eu2+,Pr3+ could be observed by the naked eye for 15 h in the dark after ceasing the irradiation source, and a series of thermoluminescence (TL) analyses confirmed continuously distributed electron traps in depth of 0.64–0.72 eV [9]. To the best of our knowledge, no reports have tried to apply Ba1-xZrSi3O9:xEu materials on optical data storage. Recently, we find that the doping of Eu ions introduces deep electron traps in Ba1-xZrSi3O9:xEu, and the trap distribution is tunable. This work indicates that Ba1-xZrSi3O9:xEu materials with deep electron traps show great potential in optical data storage applications.

Section snippets

Synthesis

Solid state reaction method was used to synthesize all samples. Raw materials BaCO3 (99.95% metals basis) and ZrO2 (99.99% metal basis) were purchased from Shanghai Aladdin Bio-Chem Technology Co. Ltd., Shanghai, China. Raw materials SiO2 (analytical pure) were purchased from Sinopharm Chemical Reagent Co. Ltd., Shanghai, China. Raw materials Eu2O3 (high pure) were purchased from Shanghai Yuelong New Materials Co. Ltd., Shanghai, China. The stoichiometric mole ratio of raw materials BaCO3, ZrO2

Doping of Eu ions introducing deep electron traps

The room temperature afterglow curves of samples Ba1-xZrSi3O9:xEu (x = 0–0.30) (1400 °C air) were measured after 254 nm UV light irradiation for 90 s, as shown in Fig. 1(a). Host sample BaZrSi3O9 shows strong afterglow intensity after ceasing the irradiation of UV light. However, the afterglow duration is short. The decay curve can be fitted by an exponential function:I(t)=I0+Aexp(tτ)where I(t) is the afterglow intensity at time t, I0 and A are constants, and τ is the decay time for the

Conclusions

Ba1-xZrSi3O9:xEu optical data storage materials were successfully synthesized by solid state reaction method. Deep electron traps at 0.90 eV below the bottom of conduction band appeared in Eu ions doped Ba1-xZrSi3O9:xEu (1400 °C air). Post-sintering in a reducing atmosphere increases the concentration of deep traps in samples Ba0·85ZrSi3O9:0.15Eu ((1400 °C air, 700 °C Ar/H2), (1400 °C air, 900 °C Ar/H2), (1400 °C air, 1100 °C Ar/H2)). Direct synthesis in a reducing atmosphere further increases

CRediT authorship contribution statement

Zhenzhen Zhou: Conceptualization, Methodology, Investigation, Writing - original draft, Funding acquisition. Caiyan Wang: Methodology, Investigation. Mingxue Deng: Methodology, Investigation. Xiaoke Xu: Resources. Qian Liu: Writing - review & editing, Supervision, Funding acquisition.

Declaration of competing interest

The authors declare that they have no known competing financial interests or personal relationships that could have appeared to influence the work reported in this paper.

Acknowledgments

This work was supported by the National Key Research and Development Program of China (Grant Number 2018YFB0704103), National Natural Science Foundation of China (Grant Number 51702343), and Natural Science Foundation of Shanghai (Grant Number 20ZR1465900).

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