An effective method to calculate RHEED rocking curves from nanoheteroepitaxial systems☆
Abstract
We report a simulation program which facilitates the calculation of changes in the intensity of specular reflection of electron beams in RHEED experiments for thin epitaxial films deposited on crystalline surfaces. It has been shown that the amplitude of the RHEED intensity oscillations greatly depends on the glancing angle of the incident electron beam, the coverages of the growing layers and the model of the scattering potential. The usefulness of the program has been tested on a well-known system of Ag grown on a Si(111) surface. The obtained experimental and computational results correspond closely. The presented algorithm, together with properly modified input data, can be applied to other systems of crystalline ultrathin layer and substrate. It also enables the implementation and tests of different combinations of the scattering potentials of the crystal, and can be applied to interpret experimental RHEED rocking curves.
New version program summary
Program title: RHEED_DIFFv2
CPC Library link to program files: https://doi.org/10.17632/7c6y233rys.1
Code Ocean capsule: https://codeocean.com/capsule/0078674
Licensing provisions: GNU General Public License 3
Programming language: C++
Journal reference of previous version: Computer Physics Communications 185 (2014) 3001–3009
Does the new version supersede the previous version?: Yes
Reasons for the new version: Responding to user’s feedback we improved functionality of the program. Moreover, we added new capabilities which make the input data process easier and more efficient than the previous one.
Nature of problem: The measurement of incident-angle dependence of RHEED intensity oscillations (RHEED rocking curve) during the growth of thin layers prepared by molecular beam epitaxy is a popular technique for quantitative and qualitative investigations of epitaxial structure perfection. Rocking curves recorded from heteroepitaxial layers are used for the non-destructive characterization of atoms near the surface [1,2]. Rocking curves are also used to determine the level of strain and its relaxation mechanism in lattice-mismatched systems. In most cases the interpretation of experimental results is based on the use of dynamical diffraction approaches. Such approaches are known to be useful in qualitative and quantitative analyses of RHEED experimental data, and especially in the interpretation of changes in intensity of reflected specular electron beam.
Solution method: RHEED intensities are calculated within the general framework described in Ref. [3] with the model of the scattering potential for heterostructures: (1)where means the potential of the full-filled substrate layers, means the potential of growing monolayer, component is responsible for diffuse scattering, and is the value of nth layer coverage in the vicinity of a growth front as a function of deposited layers [4]. The description of atom deposition at growing surfaces was obtained by solving the set of nonlinear differential equations developed for the distributed growth model [4]. (2)where (3)and (4)In these equations, is the parameter that measures the net rate transfer of atoms from one layer to the next, and is the deposition time of nth monolayer. Detailed explanations for Eqs. (2-4) are presented in Ref. [4]. The current distribution of the RHEED_DIFFv2 program includes an example input file CoverageProfiles.dat. It is one of the program output files [4] (but it can also be prepared independently of the program [4]). The CoverageProfiles.dat file contains coverage profiles for numerical solutions of Eqs. (2-4) with parameters , , and , , , , , , . The values of these parameters correspond to the Ag/Si(111) growth model proposed by Zhang and co-workers [5].
Summary of revisions: In the previous version of the program for calculating the amplitude of the reflected electron beam from growing layers, only the growth mode for the topmost surface monolayer has been taken into account [3]. In the current version it is possible to include in the calculations all growing monolayers. For this purpose, we have implemented an original algorithm for dynamical calculations of changes in the RHEED rocking curve for selected growth model of thin epitaxial films [4]. In the current version of the program, the scattering potentials of successive growing monolayers are modified by the coverage values of the monolayer near the growth front. Therefore, the program needs CoverageProfiles.dat file [4] with input data to work properly. This file stores the values of layer coverages in the vicinity of a growth front as a function of deposited layers. The data in this file are saved in two columns — the first column stores the ordinal number of deposited layers, while the second contains the values of the growth front for each of these layers.
Fig. 1(a) shows experimentally measured rocking curves for Ag layers (2.83 nm-thick) for the azimuth of incidence [11-2] and [11-2]+7°. For the [11-2] direction, and turned away by 7° from [11-2], the three dimensional crystal lattice of the Si(111) substrates and Ag(111) growing layers can be regarded as a one-dimensional array of lattice planes parallel to the surface. This azimuthal direction corresponds to the one-beam condition [3]. Figs. 1(b–c) show dynamically calculated one-beam rocking curves for Ag(111)/Si(111) layers. In the numerical calculations of the rocking curves of specular beam intensity for 2.83 nm-thick Ag layers, we used the following parameters: the electron energy of 18.8 keV, the glancing angle in the range from 0.2° to 3.5°, and the values , and 0.5 for the model of the scattering potential described by Eq. (1). Assuming that results of one-beam calculations reproduce actual experimental situations, we can conclude that for a fixed, real surface, the measured and calculated positions of Bragg reflections tally very well. The difference between them does not exceed 0.2°, which remains within the limits of experimental error.
Acknowledgments
This work has been in part supported by the National Science Centre under Grant No. 2016/21/B/ST3/01294.
References
Y. Horio, J. Yuhara, and Y. Takakuwa, Jap. J. Appl. Phys. 58 (2019) SIIA14
T. Kawamura, K. Fukutani, Surf. Sci. 688 (2019) 7-13
A. Daniluk, Comput. Phys. Commun. 185 (2014) 3001-3009.
A. Daniluk, Comput. Phys. Commun. 170 (2005) 265–286.
Z. H. Zhang, S. Hasegawa, and S. Ino, Phys. Rev. B 55 (1997) 9983.
Section snippets
Declaration of Competing Interest
The authors declare that they have no known competing financial interests or personal relationships that could have appeared to influence the work reported in this paper.
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Reflection high-energy electron diffraction (RHEED) is widely used to characterize the surface structure of single crystals. Moreover, RHEED has become a standard tool to monitor thin film growth in molecular beam epitaxy and is used to monitor other vapor deposition techniques including evaporation, sputtering, and pulsed laser deposition. With the rapid development of the fabrication methods and use of nanoparticles, RHEED operating in the transmission mode is being applied to characterize nanoparticles on surfaces. In this review, the fundamentals needed to interpret RHEED patterns from the top few atomic layers, in its reflection mode, and from nanoparticles and nanofeatures, in its transmission mode, are discussed based on the geometric kinematic approximation. Examples are provided on the interpretation of RHEED patterns from unreconstructed and 2 × 1-reconstructed Si(100), InP(100), highly oriented pyrolytic graphite, indium nanoparticles, and indium growth on Si(100)− 2 × 1.
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2022, SoftwareXMajor updates in version 2.0 of rheed++ framework include a universal algorithm designed to calculate intensity changes of RHEED oscillations both during the growth of thin heteroepitaxial layers and for the rocking curves. The changes in the RHEED oscillation amplitude show how diffracted beam intensities depend on the glancing angle of the incident electron beam, the coverage model of the growing layers, and the model of the scattering potential. The current release introduces improved framework readability, which was achieved by removing the noticed structural shortcomings. The software does not require linking to any of the existing numerical library routines.
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The review of this paper was arranged by Prof. J. Ballantyne.