Loss monitoring for undulator protection at SwissFEL

Open Access

Loss monitoring for undulator protection at SwissFEL

C. Ozkan Loch, D. Llorente Sancho, E. Divall, E. Ebner, P. Pollet, R. Ischebeck, and F. Loehl

Phys. Rev. Accel. Beams 23, 102804 – Published 20 October 2020

Abstract

At the x-ray free-electron laser SwissFEL, at the Paul Scherrer Institute, Switzerland, beam loss monitors are used to determine loss positions along the linear accelerator and protect critical elements such as the undulator magnets from excess radiation. These monitors are integrated into the machine protection system (MPS) allowing beam losses to be limited by dynamically reducing the repetition rate. This paper focuses on the types of loss monitors installed at SwissFEL and their function in protecting the machine.

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Received 23 June 2020
Accepted 16 September 2020

DOI:https://doi.org/10.1103/PhysRevAccelBeams.23.102804

Published by the American Physical Society under the terms of the Creative Commons Attribution 4.0 International license. Further distribution of this work must maintain attribution to the author(s) and the published article’s title, journal citation, and DOI.

Published by the American Physical Society