Abstract
The processes associated with transformations of oxygen-related radiation-induced defects in Czochralski-grown silicon crystals irradiated with fast electrons or neutrons and subjected to heat-treatment in the temperature range of 450–700°C have been studied by means of IR absorption spectroscopy. It is found that, upon disappearance of the VO3 and VO4 defects, new vacancy-oxygen-related complexes, which give rise to a number of vibrational absorption bands in the wavenumber range of 980–1115 cm–1, are formed. It is argued that these complexes are radiation-induced VOm centers (m ≥ 5), which serve as nucleation centers of enhanced oxygen precipitation in silicon.
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This work was supported in part by the Belarusian Republican Foundation for Fundamental Research (project no. F20-111).
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Talkachova, E.A., Murin, L.I., Medvedeva, I.F. et al. Formation of Oxygen-Containing Centers in Irradiated Silicon Crystals during Annealing in the Temperature Range of 450–700°С. Inorg. Mater. Appl. Res. 11, 1078–1082 (2020). https://doi.org/10.1134/S2075113320050330
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DOI: https://doi.org/10.1134/S2075113320050330