Effect of Substrate Holder Design on Stress and Uniformity of Large-Area Polycrystalline Diamond Films Grown by Microwave Plasma-Assisted CVD
Abstract
:1. Introduction
2. Materials and Methods
3. Results
3.1. E-Field Calculations
3.2. CVD Synthesis of Thick Diamond Layers
3.3. Bending of the Grown “Diamond-on-Si” Plates
4. Discussion
5. Conclusions
Author Contributions
Funding
Acknowledgments
Conflicts of Interest
References
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Sedov, V.; Martyanov, A.; Altakhov, A.; Popovich, A.; Shevchenko, M.; Savin, S.; Zavedeev, E.; Zanaveskin, M.; Sinogeykin, A.; Ralchenko, V.; et al. Effect of Substrate Holder Design on Stress and Uniformity of Large-Area Polycrystalline Diamond Films Grown by Microwave Plasma-Assisted CVD. Coatings 2020, 10, 939. https://doi.org/10.3390/coatings10100939
Sedov V, Martyanov A, Altakhov A, Popovich A, Shevchenko M, Savin S, Zavedeev E, Zanaveskin M, Sinogeykin A, Ralchenko V, et al. Effect of Substrate Holder Design on Stress and Uniformity of Large-Area Polycrystalline Diamond Films Grown by Microwave Plasma-Assisted CVD. Coatings. 2020; 10(10):939. https://doi.org/10.3390/coatings10100939
Chicago/Turabian StyleSedov, Vadim, Artem Martyanov, Alexandr Altakhov, Alexey Popovich, Mikhail Shevchenko, Sergey Savin, Evgeny Zavedeev, Maxim Zanaveskin, Andrey Sinogeykin, Victor Ralchenko, and et al. 2020. "Effect of Substrate Holder Design on Stress and Uniformity of Large-Area Polycrystalline Diamond Films Grown by Microwave Plasma-Assisted CVD" Coatings 10, no. 10: 939. https://doi.org/10.3390/coatings10100939