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Optical-Electrical Properties and Thickness Analysis of TiO2 Thin Films Obtained by Magnetron Sputtering

  • General and Applied Physics
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Abstract

The study of thin films with properties that meet specific needs and improve people’s quality of life has been the focus of many researchers. However, knowing and controlling the production techniques of these films have been a challenge for the industry of optical-electronic devices, functional coatings, and energy conservation. The thickness of thin films is a parameter that influences the optical and electrical characteristics of these materials, thus being one of the most important information in the plasma deposition process. Because of the need for precision in measuring the thickness of thin transparent films, this work proposes to evaluate the Swanepoel methods (envelope) and the PUMA, computational method, from optical transmittance curves and compare them with the measurements directly made by microscopy. Scanning electronics for thin films of TiO2 deposited by magnetron sputtering in different conditions. The results of this study showed that the PUMA method is capable of calculating film thicknesses of a few hundred nanometers and with few interference fringes. The PUMA method showed convergence with high precision for films produced with 30 and 60 min of treatment and a difference of 17% for films with 120 min of deposition concerning the measurements made by microscopy.

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Authors and Affiliations

  1. Physics Department, Federal Institute of Technological Education, Natal, Brazil

    V. S. S. Sobrinho

  2. Department of Mechanical Engineering, Federal University of Rio Grande do Norte, Natal, Brazil

    J. Q. M. Neto, I. A. Souza, J. C. A. Queiroz, E. O. Almeida, M. C. Feitor & T. H. C. Costa

  3. School of Science and Technology, Federal University of Rio Grande do Norte, Natal, Brazil

    L. L. F. Lima & M. S. Libório

  4. Department of Mechanical Engineering, Federal University of Piauí, Teresina, Brazil

    R. R. M. Sousa

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Sobrinho, V.S.S., Neto, J.Q.M., Lima, L.L.F. et al. Optical-Electrical Properties and Thickness Analysis of TiO2 Thin Films Obtained by Magnetron Sputtering. Braz J Phys 50, 771–779 (2020). https://doi.org/10.1007/s13538-020-00794-3

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