Fourier-transform infra-red spectroscopy with frustrated total internal reflection was used to study radiation-induced processes upon the implantation of boron and phosphorus ions into positive FP9120 diazoquinone-novolac photoresist films on silicon. Strengthening of the photoresist adhesion to monocrystalline silicon was found to be caused by the formation of ester linkages between hydroxyl groups on the surface of the silicon wafer oxide layer and carboxyl groups of 1-H-indene-3-carboxylic acid.
Similar content being viewed by others
References
A. Kondyurin and M. Bilek, Ion Beam Treatment of Polymers: Application Aspects from Medicine to Space, Elsevier (2015).
R. J. Composto, R. M. Walters, and J. Genze, Mater. Sci. Eng.: R: Rep., 38, Nos. 3–4, 107–180 (2002).
A. N. Doronin, A. P. Tyutnev, V. S. Saenko, and E. D. Pozhidaev, Perspekt. Materialy, No. 2, 15–22 (2001).
W. M. Moreau, Semiconductor Lithography. Principles, Practices and Materials, New York–London, Plenum Press (1988).
Roy Debmalya, P. K. Basu, P. Raghunathan, and S. V. Eswaran, Magn. Res. Chem., 41, 84–90 (2003).
V. I. Lebedev, V. E. Kotomina, S. V. Zelentsov, E. S. Leonov, and K. V. Sidorenko, Vestn. Nizhegorod. Univ., No. 1, 178–182 (2014).
J. S. Martins, D. G. A. L. Borges, R. C. Machado, A. G. Carpanez, R. M. Grazul, F. Zappa, W. S. Melo, M. L. M. Rocco, R. R. Pinho, and C. R. A. Lima, Eur. Polym. J., 59, 1–7 (2014).
D. I. Brinkevich, A. A. Kharchenko, S. D. Brinkevich, M. G. Lukashevich, V. B. Odzhaev, V. F. Valeev, V. I. Nuzhdin, and R. I. Khaibullin, Poverkhnost’ Rentgen., Sinkhrotr. I Neutron. Issled., No. 8, 25–30 (2017).
D. I. Brinkevich, A. A. Kharchenko, V. S. Prosolovich, V. B. Odzhaev, S. D. Brinkevich, and Yu. N. Yankovskii, Mikroélektronika, 48, No. 3, 235–239 (2019).
S. A. Babishchev, S. D. Brinkevich, D. I. Brinkevich, and V. S. Prosolovich, Khim. Vysokikh Énergii, 54, No. 1, 54–59 (2020).
J. Bocker, Spektroskopie, Vogel Industrie Medien Gmbh & Co KG, Wurzburg (1997).
D. I. Brinkevich, S. D. Brinkevich, N. V. Babishchev, B. V. Odzhaev, and V. S. Prosolovich, Mikroélektronika, 43, No. 3, 193–199 (2014).
R. D. Priestly, C. J. Ellison, L. J. Broadbelt, and J. M. Torkelson, Science, 309, No. 5733, 456–459 (2005).
B. N. Tarasevich, IR Spectra of the Major Classes of Organic Compounds. Handbook Materials [in Russian], Moskovsk. Gos. Univ., Moscow (2012).
E. Pretsch, P. Bühlmann, and C. Affolter, Determination of Organic Compounds. Tables of Spectral Data, Springer (2000).
Xiaolin Lu and Yongli Mi, Macromolecules, 38, No. 3, 839–843 (2005).
V. S. Prosolovich, D. I. Brinkevich, S. D. Brinkevich, E. V. Grinyuk, and Yu. N. Yankovskii, Materials of the Thirteenth International Conference on the Interaction of Radiation with Solids, Minsk, September 30–October 2, 2019 [in Russian], Izd. Tsentr Belarus. Gos. Univ. Minsk (2019), pp. 169–171.
J. Hanisch, K. Hinrichs, and J. Rappich, ACS Appl. Mater. Interfaces, 11, No. 34, 31434–31440 (2019).
Author information
Authors and Affiliations
Corresponding author
Additional information
Translated from Zhurnal Prikladnoi Spektroskopii, Vol. 87, No. 4, pp. 589–594, July–August, 2020.
Rights and permissions
About this article
Cite this article
Brinkevich, S.D., Grinyuk, E.V., Brinkevich, D.I. et al. Mechanism of the Adhesive Interaction of Diazoquinone-Novolac Photoresist Films with Monocrystalline Silicon. J Appl Spectrosc 87, 647–651 (2020). https://doi.org/10.1007/s10812-020-01049-4
Received:
Published:
Issue Date:
DOI: https://doi.org/10.1007/s10812-020-01049-4