Abstract
Using the method of DC magnetron sputtering, nonstructured amorphous metal coatings of Zr75Pd25 composition were obtained with an average deposition rate of 1.3 nm/s at a substrate temperature of 40°C, while crystalline coatings were formed at a higher substrate temperature. A crystalline coating with equilibrium phase composition was obtained at 350°C. Coatings deposited at intermediate temperatures contained predominantly a PdZr phase, in contrast to the equilibrium PdZr2 phase. The surface roughness of amorphous coatings was on a level of 0.2–0.5 nm, which was about ten times lower than the mean roughness of crystalline coatings with the same composition.
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ACKNOWLEDGMENTS
This work was performed using instrumentation of the Educational and Methodical Center of Lithography and Microscopy at the M.V. Lomonosov Moscow State University.
Funding
This work was supported by the Russian Foundation for Basic Research, project no. 19-08-01250.
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Translated by P. Pozdeev
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Pal, A.F., Ryabinkin, A.N. & Serov, A.O. The Influence of Magnetron Sputtering Conditions on the Structure of Zr–Pd Coatings. Tech. Phys. Lett. 46, 725–728 (2020). https://doi.org/10.1134/S1063785020070238
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DOI: https://doi.org/10.1134/S1063785020070238