Abstract
The electrical injection of the spin-polarized current into silicon in the Fe3Si/n-Si epitaxial structure is demonstrated. The spin accumulation effect is examined by measuring the local and nonlocal voltage in a special four-terminal device. The observed effect of the electric bias on the spin signal is discussed and compared with the results obtained for ferromagnet/semiconductor structures.
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Funding
This study was supported by the Russian Foundation for Basic Research, the Government of Krasnoyarsk krai, and the Krasnoyarsk Territorial Foundation for Support of Scientific and R&D Activities (project no. 18-42-243022), and a Grant of the Government of the Russian Federation for Creation of World Level Laboratories (agreement no. 075- 15-2019-1886).
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Tarasov, A.S., Luk’yanenko, A.V., Bondarev, I.A. et al. Spin Accumulation in the Fe3Si/n-Si Epitaxial Structure and Related Electric Bias Effect. Tech. Phys. Lett. 46, 665–668 (2020). https://doi.org/10.1134/S1063785020070135
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DOI: https://doi.org/10.1134/S1063785020070135