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Influence of the Self-Heating Effect on the IV Characteristics of Field Transistors on a Silicon-on-Insulator Structure at High Temperatures

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Abstract

An approach is discussed to study the effect of self-heating on the current–voltage (IV) characteristics of submicron field-effect transistors on a silicon-on-insulator (SOI) structure in ambient temperatures of 225 to 350°C. The approach consists of combining the experimental data and numerical simulation results. It is shown that with an increase in the ambient temperature the contribution of the self-heating mechanism gradually decreases. Different dynamics of the drop in current of the n- and p-transistors are noted, which is significant for analog applications and must be taken into account when designing high-temperature circuits. The proposed methodology makes it possible to critically evaluate the effect of self-heating on the IV characteristics of transistors in a wide range of high temperatures and control voltages.

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Funding

The study was supported by a state task of the Federal State Institution Federal Research Center, Scientific Research Institute of System Analysis (NIISI), Russian Academy of Sciences (basic research 47), project no. 0065-2019-0001 “Software and tools for modeling, designing, and developing elements of complex technical systems, software systems, and telecommunication networks in various problem-oriented areas” (AAAA-A19-119011790077-1).

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Correspondence to N. V. Masalskii.

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Masalskii, N.V. Influence of the Self-Heating Effect on the IV Characteristics of Field Transistors on a Silicon-on-Insulator Structure at High Temperatures. J. Commun. Technol. Electron. 65, 962–965 (2020). https://doi.org/10.1134/S1064226920070086

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  • DOI: https://doi.org/10.1134/S1064226920070086

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