Abstract
An approach is discussed to study the effect of self-heating on the current–voltage (I–V) characteristics of submicron field-effect transistors on a silicon-on-insulator (SOI) structure in ambient temperatures of 225 to 350°C. The approach consists of combining the experimental data and numerical simulation results. It is shown that with an increase in the ambient temperature the contribution of the self-heating mechanism gradually decreases. Different dynamics of the drop in current of the n- and p-transistors are noted, which is significant for analog applications and must be taken into account when designing high-temperature circuits. The proposed methodology makes it possible to critically evaluate the effect of self-heating on the I–V characteristics of transistors in a wide range of high temperatures and control voltages.
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REFERENCES
D. Wolpert and P. Ampadu, Managing Temperature Effects in Nanoscale Adaptive System (Springer-Verlag, New York, 2012).
L. Wang, T. Fjeldly, B. Iniguez, et al., IEEE Trans. Electron Devices 47 (2), (2000).
W. Jin, W. Liu, S. Fung, et al., IEEE Trans. Electron Devices 48, 730 (2001).
J.-P. Colinge, Silicon Insulator Technology: Materials to VLSI (Kluwer, Boston, 1997).
S. P. McAlister and H. Lafontaine, Solid-State Electron. 48, 2001 (2004).
R. Marani and A. G. Perri, Open Electrical & Electron. Eng. J., No. 4, 32 (2010).
Funding
The study was supported by a state task of the Federal State Institution Federal Research Center, Scientific Research Institute of System Analysis (NIISI), Russian Academy of Sciences (basic research 47), project no. 0065-2019-0001 “Software and tools for modeling, designing, and developing elements of complex technical systems, software systems, and telecommunication networks in various problem-oriented areas” (AAAA-A19-119011790077-1).
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Masalskii, N.V. Influence of the Self-Heating Effect on the I–V Characteristics of Field Transistors on a Silicon-on-Insulator Structure at High Temperatures. J. Commun. Technol. Electron. 65, 962–965 (2020). https://doi.org/10.1134/S1064226920070086
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DOI: https://doi.org/10.1134/S1064226920070086