Abstract
The influence of hydrogen on the structure of thin cerium films formed by the method of magnetron sputter deposition was investigated in this work. Hydrogen-charging of the films was carried out by the method of Langmuir hydrogen dissociation on a tungsten substrate. The cerium hydride films were coated with a protective layer of nickel or chromium. It is demonstrated in this work that the used method of hydrogen charging can be used for introduction of hydrogen also into other hydride-forming metals and alloys.
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Funding
This work was supported by the Russian Foundation for Basic Research, project no. 19-08-00452/19 of January 9, 2019.
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Translated by G. Levina
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Verbetskii, V.N., Mitrokhin, S.V., Badun, G.A. et al. Influence of Hydrogen on the Structure of Cerium Films Obtained by Magnetron Sputter Deposition on Semiconductor Wafers. Inorg. Mater. Appl. Res. 11, 977–981 (2020). https://doi.org/10.1134/S2075113320040425
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DOI: https://doi.org/10.1134/S2075113320040425