Abstract
Low-energy (50–200 eV) He and Ar ion irradiation of on Si/SiO2-based nanoporous materials is modeled with the use of the molecular dynamics method. The obtained results corroborate the experimentally observed effect of densification of near-surface layers of materials with small-size pores and low porosity due to the ion-induced pore collapse process. The differences in the He and Ar ion irradiation of nanoporous materials and the influence of ion energy on the intensity of structural changes are studied.
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This work was supported by the Russian Science Foundation, project no. 16-12-10361P.
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Translated by A. Nikol’skii
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Sycheva, A., Voronina, E. Features of Low-Energy He and Ar Ion Irradiation of Nanoporous Si/SiO2-Based Materials. Tech. Phys. Lett. 46, 532–535 (2020). https://doi.org/10.1134/S1063785020060140
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DOI: https://doi.org/10.1134/S1063785020060140