• Open Access

Time- and space-resolved optical Stark spectroscopy in the afterglow of laser-produced tin-droplet plasma

J. Scheers, R. Schupp, R. Meijer, W. Ubachs, R. Hoekstra, and O. O. Versolato
Phys. Rev. E 102, 013204 – Published 9 July 2020

Abstract

The afterglow emission from Nd:YAG-laser-produced microdroplet-tin plasma is investigated, with a focus on analyzing Stark effect phenomena and the dynamical evolution of the plasma. Time- and space-resolved optical imaging spectroscopy is performed on 11 lines from Sn iiv ions, in the 315–425-nm wavelength range. Stark shift-to-width ratios serve as the basis for unambiguous experimental tests of atomic physics theory predictions. Experiment and theory, where available, are found to be in poor agreement, and are in disagreement regarding the sign of the ratio in several cases. Spectroscopic measurements of the Stark widths in tandem with Saha-Boltzmann fits to Sn i and Sn ii lines, establish the evolution of the local temperature and density of the plasma afterglow, 20–40 ns after the end of the 15-ns-long temporally box-shaped laser pulse. A clear cool-down from 2 to 1 eV is observed of the plasma in this time window, having started at 30 eV when emitting extreme-ultraviolet (EUV) light. An exponential reduction of the density of the plasma from 10181017e cm3 is observed in this same time window. Our work is relevant for understanding the dynamics of the decaying, expanding plasma in state-of-the-art EUV nanolithography machines.

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  • Received 2 May 2020
  • Accepted 15 June 2020

DOI:https://doi.org/10.1103/PhysRevE.102.013204

Published by the American Physical Society under the terms of the Creative Commons Attribution 4.0 International license. Further distribution of this work must maintain attribution to the author(s) and the published article's title, journal citation, and DOI.

Published by the American Physical Society

Physics Subject Headings (PhySH)

Atomic, Molecular & OpticalPlasma Physics

Authors & Affiliations

J. Scheers1,2, R. Schupp1, R. Meijer1,2, W. Ubachs1,2, R. Hoekstra1,3, and O. O. Versolato1,2,*

  • 1Advanced Research Center for Nanolithography, Science Park 110, 1098 XG Amsterdam, The Netherlands
  • 2Department of Physics and Astronomy, and LaserLaB, Vrije Universiteit, De Boelelaan 1081, 1081 HV Amsterdam, The Netherlands
  • 3Zernike Institute for Advanced Materials, University of Groningen, Nijenborgh 4, 9747 AG Groningen, The Netherlands

  • *versolato@arcnl.nl

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Vol. 102, Iss. 1 — July 2020

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